EP0169541A2
Expired / Lapsed
EP
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VLSI chemical reactor
Assignee: Avantor Performance Materials LLC
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Filing: 1985-07-23
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Granted: —
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Expires: 2005-07-23
Abstract
Abstract A VLSI chemical reactor includes a fluid flow guide (12) spaced fror- the corresponding substrate (14) in the form of a wafer for significantly reducing contamination in the processing of semiconductor wafers. Processing chemicals are introduced in a continuous process through a central tube and through the fluid flow guide (12) which is substantially planar and which is parallel to the surface (32) of the wafer. A predetermined gap (30) is maintained between the guide (12) and the wafer (14) such that fluid is maintained in the gap (30) at all times critical in the processing of the wafer. In one embodiment, the guide (12) is optically transparent at predetermined portions (110) to permit monitoring of the chemical reaction taking place on the surface (32) of the wafer (14) to permit control of fluid flow to the wafer. Because of the uniform gap (30),the fluid guide (12) insures a constant thickness and composition of the optical path, and thus more accurate measurements. All drying steps are done directly and include the steps of replacing the working fluid with an inert gas and increasing the speed of rotation of either the wafer (14) or the guide (12) to remove any liquid or particulate matter by centrifugal force. Bubble reduction and fluid mixing apparatus, including different fluid guide configurations, gas relief orifices and offset rotational axes, are also described. Moreover, in one embodiment orthogonal and orbital vibrating arrangements are used in lieu of rotating motion.
Inventors
- 👤 Wayne A. Cady
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 07:28
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; C; C23; C23F; C23F1/00; C23F1/08; H10P72/70; H10P72/76; H10P72/7604; H10P72/7618; Y; Y10; Y10S; Y10S134/00; Y10S134/902; Y10S438/00; Y10S438/935
Claims Analysis
Total Claims: 34
Claim 1
Independent Claim
119 words
A chemical reactor (10) for use in processing substrates in which substrate contamination is minimized comprising: a holder (16) adapted to secure a substantially planar substrate (14) in a predetermined orientation; a fluid flow guide (12) located adjacent to and spaced from said substrate (14), said guide having a substantially planar surface (34) parallel to the planar surface of said substrate (14); means including flow control means (26) for delivering fluid through said guide (12) during processing such that fluid occupies all of said gap (30) during processing; means (32) for adjusting the gap (30) between said guide (12) and said substrate (14); and means (20; 36) for providing relative movement between said guide (12) and said substrate (14).
Claim 2
Dependent Claim
119 words
A chemical reactor (10) for use in processing substrates in which substrate contamination is minimized comprising: a holder (16) adapted to secure a substantially planar substrate (14) in a predetermined orientation; a fluid flow guide (12) located adjacent to and spaced from said substrate (14), said guide having a substantially planar surface (34) parallel to the planar surface of said substrate (14); means including flow control means (26) for delivering fluid through said guide (12) during processing such that fluid occupies all of said gap (30) during processing; means (32) for adjusting the gap (30) between said guide (12) and said substrate (14); and means (20; 36) for providing relative movement between said guide (12) and said substrate (14).
Claim 3
Dependent Claim
11 words
The reactor of claim 1 wherein said movement is rotary movement.
Claim 4
Dependent Claim
22 words
The reactor of claim 2 wherein said substrate (14) is rotated relative to said guide (12), said guide (12) being maintained stationary.
Claim 5
Dependent Claim
22 words
The reactor of claim 2 wherein said guide (12) is rotated relative to said substrate (14), said substrate (14) being maintained stationary.
Claim 6
Dependent Claim
17 words
The reactor of claim 2 wherein said substrate (14) and guide (12) are rotated in opposite directions.
Claim 7
Dependent Claim
17 words
The reactor of claims 1 wherein either said guide (12) or said substrate (14) is maintained stationary.
Claim 8
Dependent Claim
25 words
The reactor according to any of claims 1 to 6, wherein said holder (80, 92) includes means for controlling the temperature of said substrate (14).
Claim 9
Dependent Claim
23 words
The reactor of claim 7 wherein said temperature control means includes means for circulating a fluid of controlled temperature within said holder (80).
Claim 10
Dependent Claim
24 words
The reactor of claim 7 or 8 wherein said temperature control means includes electrical means for controlling the temperature of said holder (80, 92).
Claim 11
Dependent Claim
31 words
The reactor of claim 9 wherein said electrical means includes a heating coil (94) within said holder (92) and means (96; 100, 102) for applying electrical energy to said coil (94).
Claim 12
Dependent Claim
15 words
The reactor of claim 9 or 10 wherein said electrical means includes a Pelletier device.
Claim 13
Dependent Claim
31 words
The reactor according to any of the preceding claims wherein said guide (12) includes means (70, 74) at said planar surface (34) for increasing the mixing distribution of fluid dispensed therethrough.
Claim 14
Dependent Claim
21 words
The reactor of claim 12 wherein said means for increasing mixing includes outwardly running grooves (70) in said guide surface (34).
Claim 15
Dependent Claim
21 words
The reactor of claim 12 wherein said means for increasing mixing includes outwardly running ridges (74) on said guide surface (34).
Claim 16
Dependent Claim
33 words
The reactor according to any of the preceding claims wherein said fluid delivery means includes one or more apertures (54, 56, 58, 64) through and adjacent to the center of said guide (12).
Claim 17
Dependent Claim
18 words
The reactor of claim 15 wherein at least one of said apertures includes an expanded divided orifice (58).
Claim 18
Dependent Claim
22 words
The reactor of claim 15 or 16 wherein at least one of said apertures (56) is restricted at said guide surface (34).
Claim 19
Dependent Claim
24 words
The reactor according to any of claims 15 to 17 wherein at least one of said apertures (54) is flared outwardly towards said substrate.
Claim 20
Dependent Claim
55 words
The reactor according to any of claims 15 to 18 wherein one of said apertures (64) is at the center of said guide and further including fluid release channels through said guide (12) adjacent the center thereof to prevent fluid bubbles from existing in the gap (30) between said guide (12) and said substrate (14).
Claim 21
Dependent Claim
28 words
The reactor according to any of claims 2 to 19 wherein the axes of rotation of said guide (12) and said substrate are offset to prevent bubble formation.
Claim 22
Dependent Claim
29 words
The reactor according to any of the preceding claims and further including means (50, 52; 112, 116) for monitoring a predetermined parameter of the fluid in said gap (30).
Claim 23
Dependent Claim
23 words
The reactor of claim 21 and further includingmeans (26) for modifying the fluid flow through said guide (12) responsive to said monitored parameter.
Claim 24
Dependent Claim
32 words
The reactor of claim 21 or 22 wherein said monitoring means (50, 52; 112, 116) includes means (114) for directing light into said gap (30) and for detecting light in said gap.
Claim 25
Dependent Claim
27 words
The reactor of claim 23 wherein said light directing means (114) includes means for establishing a light path through at least a portion (110) of said guide.
Claim 26
Dependent Claim
20 words
The reactor of claim 24 wherein said light path (110) establishing means includes an optically transparent window in said guide.
Claim 27
Dependent Claim
22 words
The reactor according to any of the preceding claims wherein said guide (12) is optically transparent to light of a predetermined wavelength.
Claim 28
Dependent Claim
27 words
The reactor of claim 26 and further including a light source (112) and means (114) for directing light through said guide (12) and into said gap (30).
Claim 29
Dependent Claim
19 words
The reactor of claim 27 wherein said light source (112) is circular and is centered above said guide (12).
Claim 30
Independent Claim
143 words
A method for improving the reduction of contamination in the treatment of substrates processed with chemicals which contact a top surface in the substrate comprising the steps of: (a) providing the substrate (14) and a holder (16) therefor; (b) providing a fluid flow guide (12) immediately above the substrate(14); providing relative motion between the substrate (14) and the fluid flow guide (12) such that any chemical reaction taking place on said substrate (14) does so through a combined mixing action and centrifugal force action which causes the chemicals to flow from the center of the substrate (14) outwardly; and providing that the gap (30) between the fluid flow guide (12) and the substrate (14) is such that the gap (30) is continuously filled with fluid during processing in which any active chemical reaction is taking place on the surface of the substrate (14).
Claim 31
Independent Claim
143 words
A method for improving the reduction of contamination in the treatment of substrates processed with chemicals which contact a top surface in the substrate comprising the steps of: (a) providing the substrate (14) and a holder (16) therefor; (b) providing a fluid flow guide (12) immediately above the substrate(14); providing relative motion between the substrate (14) and the fluid flow guide (12) such that any chemical reaction taking place on said substrate (14) does so through a combined mixing action and centrifugal force action which causes the chemicals to flow from the center of the substrate (14) outwardly; and providing that the gap (30) between the fluid flow guide (12) and the substrate (14) is such that the gap (30) is continuously filled with fluid during processing in which any active chemical reaction is taking place on the surface of the substrate (14).
Claim 32
Dependent Claim
38 words
The method of claim 29 and further including the step of initially providing a relatively large gap and after introduction of fluid into the gap reducing the gap thereby to reduce the formation of bubbles within the gap.
Claim 33
Dependent Claim
79 words
The method of claim 29 or 30 wherein the process includes a drying step in which the relative motion of the substrate (14) with respect to the fluid guide (12) is rotary and at low rpm, wherein the working fluid which creates the chemical reaction is replaced by an inert gas, and wherein the relative speed of rotation between the guide (12) and the substrate (14) is increased by at least an order of magnitude during the drying process.
Claim 34
Dependent Claim
22 words
Method of claim 29, characterized in that it is carried out with the reactor according to any of claims 1 to 28.
References Cited (Backward Citations)
No citation records indexed.
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