EP0168056A2
Expired / Lapsed
EP
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Apparatus for ion beam work
Assignee: Hitachi Ltd
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Filing: 1985-07-12
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Granted: —
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Expires: 2005-07-12
Abstract
Abstract This invention discloses an ion beam work apparatus which comprises ion beam radiation means (2, 3) for focusing and radiating an ion beam (10) extracted from an ion source (1) to a target (4) put on a moving mechanism (5), and scanning two-dimensionally the radiation position; secondary particle detection means (6) for detecting the secondary particles (11) generated from the target (4) upon radiation of the ion beam (10); and superposition-display means (14) for superposing the secondary particle image (33) with a different kind of image (34) containing such information that is not contained in the secondary particle image (33), and displaying the resulting image (35); and which can accurately position the beam radiation position to lower wiring layers of the target (4) such as a semiconductor device that cannot be observed by the secondary particle image (33) obtained by scanning the focused ion beam (10).
Inventors
- 👤 Akira Shimase
- 👤 Hiroshi Yamaguchi
- 👤 Satoshi Haraichi
- 👤 Tateoki Miyauchi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-02 00:15
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; H01J37/3053; H01J37/3056; H01J37/3002; H01J37/3005; H01J37/304
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
119 words
An ion beam work apparatus comprising: ion beam radiation means (2, 3) for focusing and radiating an ion beam (10) extracted from an ion source (1) on a target (4) placed on a moving mechanism (5), and scanning two-dimensionally the ion beam (10) radiation position; secondary particle detection means (6) for detecting secondary particles (11) generated from said target (4) upon radiation of said ion beam (10), and forming a secondary particle image (33) from the detection signals; and superposition-display means (14) for superposing said secondary particle image (33) with a different kind of image (34; 45; 57) containing such information that is not contained in said secondary particle image (33), and displaying the resulting image (35; 46; 59).
Claim 2
Dependent Claim
119 words
An ion beam work apparatus comprising: ion beam radiation means (2, 3) for focusing and radiating an ion beam (10) extracted from an ion source (1) on a target (4) placed on a moving mechanism (5), and scanning two-dimensionally the ion beam (10) radiation position; secondary particle detection means (6) for detecting secondary particles (11) generated from said target (4) upon radiation of said ion beam (10), and forming a secondary particle image (33) from the detection signals; and superposition-display means (14) for superposing said secondary particle image (33) with a different kind of image (34; 45; 57) containing such information that is not contained in said secondary particle image (33), and displaying the resulting image (35; 46; 59).
Claim 3
Dependent Claim
39 words
The ion beam work apparatus as defined in claim 1 wherein said different kind of image (34) to be superposed with said secondary particle image (33) is one that is constituted from the design data of said target (4).
Claim 4
Dependent Claim
30 words
The ion beam work apparatus as defined in claim 1 wherein said different kind of image (45) to be superposed with said.secondary particle image (33) is an optical microscopic image.
Claim 5
Dependent Claim
46 words
The ion beam work apparatus as defined in claim 3 wherein said secondary particle image (33) is taken from said target (4), and said optical microscopic image (45) is taken from a reference target (38) which is the same kind as that of said target (4).
Claim 6
Dependent Claim
49 words
The ion beam work apparatus as defined in claim 4 wherein an XY6 stage (37) for bringing the position of said reference target (38) into agreement with the position of said target (4) is placed on an XY stage (5) for placing thereon both of said targets (4, 38).
Claim 7
Dependent Claim
42 words
The ion beam work apparatus as defined in claim 5 wherein the relative position of both of said targets' (4, 38) is mechanically adjusted by said XYθ stage (37), and then fine adjustment of said optical microscopic image (45) is made electrically.
Claim 8
Dependent Claim
45 words
The ion beam work apparatus as defined in claim 1 wherein said target (4) taking thereinto said optical microscopic image (45) is moved to the position of the optical axis of said ion optical system so as to take into said secondary particle image (33).
Claim 9
Dependent Claim
41 words
The ion beam work apparatus as defined in claim 7 wherein fine adjustment of the position of said optical microscopic image is effected electrically when said optical microscopic image (45) is to be superposed after the movement of said stage (5).
Claim 10
Dependent Claim
45 words
The ion beam work apparatus as defined in claim 1 wherein said different kind of image comprises a combination of at least two images constituted by an optical microscopic image (45), a scanning electron microscopic image (57) and an image (34) constituted by design data.
References Cited (Backward Citations)
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