Device for purifying halogen containing off-gases

Abstract

Abstract In particular, off-gases from plants for the plasma-chemical etching of semiconductor materials for electronic components are purified. The device comprises a heatable solid body which is provided in the reaction chamber located in the off-gas stream between a plasma-etching instalation and the vacuum system thereof, the off-gas being passed in forced flow along the wall of the solid body, reacting therewith and leaving the reaction chamber in a purified state. The reaction chamber is of cylindrical structure, has a cooling device and means for feeding purging gas and reaction gas and is built for easy servicing via a removable flanged cover. The device can be used for purifying chlorine-containing off-gases, and fluorine-containing off-gases can be purified after changing the solid body.

Inventors

• 👤 Hans-Jürgen Tiller
• 👤 Dorothea Dr. Berg
• 👤 Reinhard Dr. Fendler
• 👤 Reinhard Voigt
• 👤 Ulf Weber
• 👤 Jürgen Helbig
• 👤 Klaus-Jürgen Lehmann

Bibliographic Details