EP0161476A2
Expired / Lapsed
EP
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A process for producing a negative tone resist image
Assignee: International Business Machines Corp
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Filing: 1985-04-11
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Granted: —
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Expires: 2005-04-11
Abstract
Abstract A negative tone resist image is produced by the successive steps of exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.
Inventors
- 👤 Hiroshi Ito
- 👤 Scott Arthur Macdonald
- 👤 Robert Dennis Miller
- 👤 Carlton Grant Willson
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 13:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/26; G03F7/265; G03F7/36
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
67 words
A process for producing a negative tone resist image comprising the successive steps of: exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.
Claim 2
Dependent Claim
67 words
A process for producing a negative tone resist image comprising the successive steps of: exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.
Claim 3
Dependent Claim
26 words
A process as claimed in Claim 1, in which the film comprises a polymer containing a group which is removed directly on exposure to the radiation.
Claim 4
Dependent Claim
13 words
A process as claimed in Claim 2, in which the polymer is poly(p-formyloxystyrene).
Claim 5
Dependent Claim
35 words
A process as claimed in Claim 1, in which the film comprises (A) a polymer containing an acid labile group pendant from the polymer backbone, and (B) a monomeric substance that liberates acid upon exposure.
Claim 6
Dependent Claim
13 words
A process as claimed in Claim 4, in which the polymer is poly(t-butylmethacrylate).
Claim 7
Dependent Claim
14 words
A process as claimed in Claim 4, in which the polymer is poly(t-butyloxycarbonyloxy styrene).
Claim 8
Dependent Claim
20 words
A process as claimed in any of Claims 4 to 6, in which the monomeric substance is an onium salt.
Claim 9
Dependent Claim
19 words
A process as claimed in any of Claims 4 to 6, in which the monomeric substance is triphenylsulfonum hexafluoroarsenate.
Claim 10
Dependent Claim
19 words
A process as claimed in any of Claims 4 to 6, in which the monomeric substance is triphenylfulfonum hexafluoroantimonate.
Claim 11
Dependent Claim
16 words
A process as claimed in any preceding claim, in which the organometallic reagent is an organosilane.
Claim 12
Dependent Claim
19 words
A process as claimed in any of Claims 1 to 9, in which the organometallic reagent is an organostannane.
Claim 13
Dependent Claim
18 words
A process as claimed in any of Claims 1 to 9, in which the organometallic reagent is hexamethyldisilazane.
Claim 14
Dependent Claim
20 words
A process as claimed in any of Claims 1 to 9, in which the organometallic reagent is trimethyl silyl chloride.
Claim 15
Dependent Claim
25 words
A process as claimed in any preceding claim, in which a thick film of unsensitized polymer is positioned between the first-mentioned film and a substrate.
References Cited (Backward Citations)
No citation records indexed.
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