EP0155000A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method of manufacturing optical memory element
Assignee: Sharp Corp
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Filing: 1985-03-14
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Granted: —
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Expires: 2005-03-14
Abstract
Abstract A method of manufacturing an optical memory element, which includes the steps of applying a first photo-resist layer (2) onto a glass substrate (1) for an optical memory element, laying a mask plate (3) on the glass substrate (1) applied with the first photo-resist layer (2), with the mask plate (3) being prepared by covering a surface of a transparent substrate (6) with metallic layers formed into a guide pattern configuration, irradiating ultraviolet rays onto the first photo-resist layer (2) through the mask plate (3), transferring the guide patterns of the mask plate (3) onto the first photo-resist layer, and engaving the guide patterns in the glass substrate (1) by etching after developing the first photo-resist layer (2).
Inventors
- 👤 Kenji Ohta
- 👤 Akira Takahashi
- 👤 Tetsuya Inui
- 👤 Junji Sharp Akebono-Ryo 424 Hirokane
- 👤 Toshihisa Deguchi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 21:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0035; G11; G11B; G11B11/00; G11B11/10; G11B11/105; G11B11/10582; G11B7/00; G11B7/24; G11B7/26; G11B7/261; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
123 words
A method of manufacturing an optical memory element, which comprises the steps of: (a) applying a first photo-resist film (2) onto a glass substrate (1) for an optical memory element; (b) laying a mask plate (3) on said glass substrate (1) applied with said first photo-resist film (2), said mask plate (3) being prepared by covering a surface of a transparent substrate (6) with metallic films formed into a guide pattern configuration; (c) irradiating ultraviolet rays onto said first photo-resist film (2) through said mask plate (3); (d) transferring the guide patterns of said mask plate (3) onto said first photo-resist film (2); and (e) engraving the guide patterns in said glass substrate (1) by etching after developing said first photo-resist film (2).
Claim 2
Independent Claim
123 words
A method of manufacturing an optical memory element, which comprises the steps of: (a) applying a first photo-resist film (2) onto a glass substrate (1) for an optical memory element; (b) laying a mask plate (3) on said glass substrate (1) applied with said first photo-resist film (2), said mask plate (3) being prepared by covering a surface of a transparent substrate (6) with metallic films formed into a guide pattern configuration; (c) irradiating ultraviolet rays onto said first photo-resist film (2) through said mask plate (3); (d) transferring the guide patterns of said mask plate (3) onto said first photo-resist film (2); and (e) engraving the guide patterns in said glass substrate (1) by etching after developing said first photo-resist film (2).
Claim 3
Dependent Claim
76 words
A method of manufacturing an optical memory element as claimed in Claim 1, wherein said mask plate (3) is prepared by the steps of applying a second photo-resist film (9) onto the metallic films (7, 8) formed on said transparent substrate (6), recording the guide patterns on said second photo-resist film (9) by laser beam, and forming said guide pattern configuration in said metallic films (7, 8) by etching after developing said second photo-resist film (9).
Claim 4
Dependent Claim
44 words
A method of manufacturing an optical memory element as claimed in Claim 2, wherein said mask plate (3) is a rotary member in a circular shape, said laser beam being irradiated from a structure moving in a radial direction of said mask plate (3).
Claim 5
Dependent Claim
38 words
A method of manufacturing an optical memory element as claimed in Claim 3, wherein said mask plate (3) is formed with an opening (13) so as to be fixedly supported thereby with respect to a rotating drive member.
Claim 6
Independent Claim
140 words
A method of manufacturing an optical memory element, which comprises the steps of: (a) applying a first photo-resist film (2) onto a glass substrate (1) for an optical memory element; (b) laying a mask plate (3B) on said glass substrate (1) applied with said first photo-resist film (2), said mask plate (3B) being prepared by covering a surface of a resin layer (R) having a sufficient flexibility larger than that of a transparent substrate (6) for said mask plate (3B) with metallic films formed into a guide pattern configuration; (c) irradiating ultraviolet rays onto said first photo-resist film (2) through said mask plate (3B); (d) transferring the guide patterns of said mask plate (3) onto said first photo-resist film (2); and (e) engraving the guide patterns in said glass substrate (1) by etching after developing said first photo-resist film (2).
Claim 7
Independent Claim
140 words
A method of manufacturing an optical memory element, which comprises the steps of: (a) applying a first photo-resist film (2) onto a glass substrate (1) for an optical memory element; (b) laying a mask plate (3B) on said glass substrate (1) applied with said first photo-resist film (2), said mask plate (3B) being prepared by covering a surface of a resin layer (R) having a sufficient flexibility larger than that of a transparent substrate (6) for said mask plate (3B) with metallic films formed into a guide pattern configuration; (c) irradiating ultraviolet rays onto said first photo-resist film (2) through said mask plate (3B); (d) transferring the guide patterns of said mask plate (3) onto said first photo-resist film (2); and (e) engraving the guide patterns in said glass substrate (1) by etching after developing said first photo-resist film (2).
References Cited (Backward Citations)
No citation records indexed.
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