EP0154561A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Improved apparatus and method for laser-induced chemical vapor deposition
Assignee: SPX Technologies Inc
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Filing: 1985-03-07
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Granted: —
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Expires: 2005-03-07
Abstract
Abstract This invention relates to apparatus and methods for laser induced vapor deposition upon a substrate. The invention includes apparatus isolated from the deposition chamber for preheating the wafers before deposition. A bellows arrangement permits adjustment of the heat applied to the substrate.
Inventors
- 👤 Gregory A. Roche
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 02:43
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/483; C23C16/481; H; H05; H05B; H05B3/00; H05B3/0033; H05B3/0038; H05B3/0047
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
132 words
A system for laser induced chemical vapor deposition of a substance on.a substrate in a vapor deposition chamber without deposition of vapor on the chamber walls, comprising: means for positioning a substrate in the vapor deposition chamber; means, isolated from the deposition chamber, for producing infrared radiation to heat the wafer to a predetermined temperature before vapor deposition; window means-for transmitting the infrared radiation to the substrate; means for concentrating the infrared radiation upon the window means; means for controlling the distance and angular orientation of the window means relative to the wafer to control application of infrared radiation thereto; means for supplying to the deposition chamber donors of a substance to be deposited; and means for interacting the donors with coherent light to induce deposition of the substance upon the substrate.
Claim 2
Independent Claim
132 words
A system for laser induced chemical vapor deposition of a substance on.a substrate in a vapor deposition chamber without deposition of vapor on the chamber walls, comprising: means for positioning a substrate in the vapor deposition chamber; means, isolated from the deposition chamber, for producing infrared radiation to heat the wafer to a predetermined temperature before vapor deposition; window means-for transmitting the infrared radiation to the substrate; means for concentrating the infrared radiation upon the window means; means for controlling the distance and angular orientation of the window means relative to the wafer to control application of infrared radiation thereto; means for supplying to the deposition chamber donors of a substance to be deposited; and means for interacting the donors with coherent light to induce deposition of the substance upon the substrate.
Claim 3
Dependent Claim
13 words
The system of claim 1, wherein the producing means includes a halogen lamp.
Claim 4
Dependent Claim
25 words
The system of claim 2, wherein the concentrating means includes: a reflector proximate the lamp for producing a beam of substantially constant intensity infrared radiation.
Claim 5
Dependent Claim
41 words
The system of claim 2, wherein the controlling means includes: a bellows having an end connected to the window means; and means for adjusting the bellows to control the distance and angular orientation of the window means relative to the substrate.
Claim 6
Dependent Claim
13 words
The system of claim 4, further including servo means for adjusting the bellows.
Claim 7
Dependent Claim
21 words
The system of claim 1, wherein the positioning means includes means for transporting a plurality of substrates into the deposition chamber.
Claim 8
Dependent Claim
32 words
The system of claim 5, wherein the transporting means includes a boat having a plurality of stepped diameter passages therethrough for supporting a generally circular substrate on a shoulder between the steps.
Claim 9
Dependent Claim
74 words
The system of claim 6, further including: a plurality of window means for transmitting infrared radiation to each stepped diameter passage to heat a substrate mounted therein; means, isolated from the deposition chamber, for applying a beam of infrared radiation to the window means; and a plurality of bellows means connected to each window means for separately adjusting the relative distances and the angular orientations of each window means relative to the corresponding substrate.
Claim 10
Dependent Claim
18 words
The system of claim 8, further including servo means for adjusting the bellows means independently of one another.
Claim 11
Dependent Claim
122 words
A process for laser induced chemical vapor deposition of a substance in a vapor deposition chamber without deposition on the chamber walls, comprising the steps of: positioning a substrate adjacent a window in the vapor deposition chamber; directing infrared radiation upon the substrate through the window to heat the substrate to a predetermined temperature; reflecting the output of an infrared light source to form a beam of substantially uniform intensity; and adjusting the window with a bellows to control the position of the window relative to the substrate; supplying a donor of the substance to be deposited upon the substrate thereto; and interacting a coherent light beam with the oxygen and gaseous donor to induce deposition of the substance on the substrate.
Claim 12
Dependent Claim
122 words
A process for laser induced chemical vapor deposition of a substance in a vapor deposition chamber without deposition on the chamber walls, comprising the steps of: positioning a substrate adjacent a window in the vapor deposition chamber; directing infrared radiation upon the substrate through the window to heat the substrate to a predetermined temperature; reflecting the output of an infrared light source to form a beam of substantially uniform intensity; and adjusting the window with a bellows to control the position of the window relative to the substrate; supplying a donor of the substance to be deposited upon the substrate thereto; and interacting a coherent light beam with the oxygen and gaseous donor to induce deposition of the substance on the substrate.
Claim 13
Dependent Claim
44 words
The process of claim 10, further including the steps of: positioning a plurality of substrates in the deposition chamber adjacent corresponding windows; and adjusting the windows independently of one another with corresponding bellows to control the positions of the windows relative to the substrate.
References Cited (Backward Citations)
No citation records indexed.
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