EP0153854A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Process for forming a pattern film
Assignee: Seiko Instruments Inc
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Filing: 1985-02-25
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Granted: —
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Expires: 2005-02-25
Abstract
Abstract A process for forming a pattern film comprises irradiating a specific portion of a sample with a focused ion beam in an atmosphere whereby the vapour of an organic compound is present thereby polymerising or carbonising the organic compound on the specific portion to form a desired pattern film thereon. The organic compound used has a vapour pressure at 300°K between 1 x 10 -4 and 5 x 10- 3 Torr.
Inventors
- 👤 Yoshimoto C/O Seiko Instruments & Nakagawa
- 👤 Takashi C/O Seiko Instruments & Kaito
- 👤 Hisao C/O Seiko Instruments & Hojo
- 👤 Masahiro C/O Seiko Instruments & Yamamoto
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-01 11:42
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/72; G03F1/74; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/947
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
74 words
A process for forming a pattern film which comprises irradiating a specific portion of a sample with a focused ion beam in an atmosphere where the vapour of an organic compound is present, thereby polymerising or carbonising the organic compound on the specific portion to form a desired pattern film thereon characterised in that said organic compound has a vapour pressure at 300°K between 1 x 10 -4 and 5 x 10 -3 Torr.
Claim 2
Dependent Claim
74 words
A process for forming a pattern film which comprises irradiating a specific portion of a sample with a focused ion beam in an atmosphere where the vapour of an organic compound is present, thereby polymerising or carbonising the organic compound on the specific portion to form a desired pattern film thereon characterised in that said organic compound has a vapour pressure at 300°K between 1 x 10 -4 and 5 x 10 -3 Torr.
Claim 3
Dependent Claim
20 words
A process as claimed in claim 1 characterised in that said organic compound is a tri- or tetracyclic aromatic compound.
Claim 4
Dependent Claim
23 words
A process as claimed in claim 1 or 2 characterised in that said organic compound has a molecular weight between 200 and 400.
Claim 5
Dependent Claim
27 words
A process as claimed in any preceding claim characterised in that said organic compound consists mainly of a hydrocarbon compound and is free from any metal atom.
Claim 6
Dependent Claim
22 words
A process as claimed in any preceding claim characterised in that said organic compound is phenanthrene, pyrene, methylphenanthrene, fluoranthene,. anthrone or triphenylmethane.
References Cited (Backward Citations)
No citation records indexed.
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