EP0151861A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Thermally controlled sputtering of high anisotropy magnetic material
Assignee: Grumman Corp
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Filing: 1984-10-12
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Granted: —
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Expires: 2004-10-12
Abstract
Abstract A substrate coating of a ferromagnetic alloy of a rare earth-transition element mixture is prepared by a hollow cathode sputtering deposition method to produce near single domain films on various substrates.
Inventors
- 👤 Ronald G. Pirich
- 👤 David J. Larson
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 19:32
CPC Classifications
H; H01; H01F; H01F10/00; H01F10/08; H01F10/10; H01F10/12; H01F10/126; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; H01F41/00; H01F41/14; H01F41/18
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
82 words
A method of coating a substrate with a magnetic material composed of a ferromagnetic alloy of a rare earth-transition element mixture which comprises hollow cathode sputtering a ferromagnetic alloy of a rare earth-transition element mixture from multiple sources, wherein each component of said mixture is sputtered from one of said multiple sources, at a temperature of from 200°C to 1000°C in an inert atmosphere onto a substrate to provide a coating thickness on said substrate of from 0.1 microns to 100 microns.
Claim 2
Independent Claim
82 words
A method of coating a substrate with a magnetic material composed of a ferromagnetic alloy of a rare earth-transition element mixture which comprises hollow cathode sputtering a ferromagnetic alloy of a rare earth-transition element mixture from multiple sources, wherein each component of said mixture is sputtered from one of said multiple sources, at a temperature of from 200°C to 1000°C in an inert atmosphere onto a substrate to provide a coating thickness on said substrate of from 0.1 microns to 100 microns.
Claim 3
Dependent Claim
21 words
The method of claim 1, wherein said sputtering is effected at a deposition rate of from 1 micron/hr to 50 microns/hr.
Claim 4
Dependent Claim
21 words
The method of claim 1 or 2, wherein the particle size of said substrate coating is less than about 2 microns.
Claim 5
Independent Claim
32 words
The method of any of claims 1 to 3, wherein said inert atmosphere is provided by a gas selected from argon, helium, or neon or a suitable mixture of said inert gases.
Claim 6
Independent Claim
43 words
The method of any of claims 1 to 4, wherein said hollow cathode sputtering is effected in a hollow cathode sputtering apparatus which employs a pressure in the range of from 10 microns to 200 microns, inert gas or mixture of inert gases.
Claim 7
Independent Claim
27 words
The method of any of claims 1 to 5, wherein said substrate is contained in a substrate holder comprising a copper block having resistive heaters embedded therein.
Claim 8
Dependent Claim
23 words
The method of claim 6, further comprising containing said substrate holder in a static magnetic field which produces in-plane or out-of-plane magnetic alignment.
Claim 9
Independent Claim
33 words
The method of any of claims 1 to 7 wherein said substrate is selected from copper, aluminium, aluminium oxide, titanium, glass or a transition metal element such as iron, Mn, Co, and Ni.
Claim 10
Independent Claim
36 words
The method of any of claims 1 to 8, wherein said ferromagnetic alloy is selected from a mixture of Sm 2 Co 17 and Co and Sm and produced at an Ar pressure of 150 microns.
Claim 11
Dependent Claim
18 words
The method of claim 9, wherein said substrate temperature during processing is maintained in the range of 900°C.
Claim 12
Independent Claim
34 words
The method of any of claims 1 to 8, wherein said ferromagnetic alloy is selected from a mixture of SmFe 17 and Fe and Sm and produced at an Ar pressure of 10 microns.
Claim 13
Dependent Claim
18 words
The method of claim 11, wherein said substrate temperature during processing is maintained in the range of 800-900°C.
References Cited (Backward Citations)
No citation records indexed.
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