EP0144851A2
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EP
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Sputtering of a permalloy layer
Assignee: Siemens AG
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Filing: 1984-11-19
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Granted: —
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Expires: 2004-11-19
Abstract
Abstract Translated from German Es wird ein Permalloy-Aufstäubverfahren beschrieben, das es ermöglicht, mehrere Mikrometer dicke Schichten durch Kathodenzerstäubung reproduzierbar mit kleinem H c aufzustäuben. Dies wird durch gezielte Zugabe von Restgas, zum Beispiel von Stickstoff, zum Aufstäubgas erreicht. A permalloy sputtering process is described which makes it possible to reproducibly sputter several micrometer thick layers by sputtering with a small H c . This is achieved by the targeted addition of residual gas, for example nitrogen, to the sputtering gas.
Inventors
- 👤 Hans-Werner Dipl.-Ing. Pötzlberger
- 👤 Siegfried Bock
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 19:32
CPC Classifications
H; H01; H01F; H01F41/00; H01F41/14; H01F41/18
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