EP0140660A2
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EP
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Method of forming amorphous polymeric halosilane films and products produced therefrom
Assignee: Dow Silicones Corp
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Filing: 1984-10-19
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Granted: —
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Expires: 2004-10-19
Abstract
Abstract There is described herein a method of forming amorphous polymeric halosilane films by decomposition on a substrate of bromo-, chloro-, fluoro-, di- or polysilanes at a temperature of between about 250 DEG C and 550 DEG C. As an example, hexafluorodisilane was decomposed at 350 DEG C for 45 minutes and formed a gold lightly reflective film on a glass substrate. The films so formed may have application as solar cells, thin film transistors, optical data storage media and scratch resistant coatings.
Inventors
- 👤 Kenneth George Sharp
- 👤 Leslie Diane Stark
- 👤 Hsien-Kun Chu
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-05 12:42
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2923; C; C23; C23C; C23C16/00; C23C16/22; C23C16/24; H10P14/24; H10P14/2922; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
65 words
A method of forming amorphous polymeric halosilane films on a substrate characterized by decomposing at least one vapor-phase halogenated silane chosen from the group consisting of bromo-, chloro- and fluoro- di-and polysilanes at a temperature between about 250°C. and about 550°C. in a reaction chamber containing a substrate which is thermally and chemically stable at the decomposition temperature in the atmosphere of the reaction chamber.
Claim 2
Independent Claim
65 words
A method of forming amorphous polymeric halosilane films on a substrate characterized by decomposing at least one vapor-phase halogenated silane chosen from the group consisting of bromo-, chloro- and fluoro- di-and polysilanes at a temperature between about 250°C. and about 550°C. in a reaction chamber containing a substrate which is thermally and chemically stable at the decomposition temperature in the atmosphere of the reaction chamber.
Claim 3
Dependent Claim
38 words
A method as defined in claim 1 wherein an additional compound decomposes in the presence of the di-or polysilane being used and contains an element for doping the film being produced to alter its electrical or optical characteristics.
Claim 4
Dependent Claim
26 words
A method as defined in claim 1 wherein the di- and polysilanes contain functional groups containing desired element for incorporating heteroatoms in the film being produced.
Claim 5
Dependent Claim
38 words
A method of forming an electrically active portion of an electronic device characterized by forming an amorphous polymeric halosilane film according to the method of claim 1 and altering the electrical properties of the film by ion implantation.
Claim 6
Dependent Claim
12 words
An amorphous polymeric halosilane film made by the method of claim 1.
Claim 7
Dependent Claim
12 words
An amorphous polymeric halosilane film made by the methcd of claim 2.
Claim 8
Dependent Claim
12 words
An amorphous polymeric halosilane film made by the method of claim 3.
Claim 9
Dependent Claim
34 words
A method of forming an optically readable medium which comprises forming a film according to the method of claim 1 and selectively altering portions of the film by exposing it to a laser beam.
Claim 10
Independent Claim
60 words
A method of making a scratch-resistant protective coating on a substrate characterized by decomposing vapor-phase halogenated silanes chosen from the group consisting of bromo-, chloro-, fluoro-, di- and polysilanes at a temperature between 250°C. and 550°C. in a reaction chamber containing a substrate which is thermally and chemically stable at the decomposition temperature in the atmosphere of the reaction chamber.
Claim 11
Independent Claim
60 words
A method of making a scratch-resistant protective coating on a substrate characterized by decomposing vapor-phase halogenated silanes chosen from the group consisting of bromo-, chloro-, fluoro-, di- and polysilanes at a temperature between 250°C. and 550°C. in a reaction chamber containing a substrate which is thermally and chemically stable at the decomposition temperature in the atmosphere of the reaction chamber.
Claim 12
Dependent Claim
15 words
A substrate having a scratch resistant coating thereon made by the method of claim 9.
References Cited (Backward Citations)
No citation records indexed.
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