EP0136672A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method and apparatus for X-ray exposure
Assignee: Hitachi Ltd
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Filing: 1984-09-28
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Granted: —
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Expires: 2004-09-28
Abstract
Abstract The present invention relates to a method and an apparatus of a step-and-repeat type X-ray exposure system, in which the contrast characteristic is improved. In order to prevent a multiple exposure due to the transmitted X-rays through gold patterns in successive adjacent shots, a stop (11) is provided on an X-ray mask (3 min ) separately from a pattern, thereby intercepting the incident X-rays to the portion other than an exposure portion (Ex) on a substrate (5) surface. In addition, in order to fully display the above effect, there is provided means for fixing and moving an X-ray source, the mask and the substrate, respectively.
Inventors
- 👤 Yukio Kembo
- 👤 Asahiro Kuni
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 06:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; H; H10; H10D; H10D99/00; G03F7/20; G03F7/2037; G03F7/2039; H10P; H10P95/00
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
96 words
A method for X-ray exposure in which the X-rays radiated from an X-ray source (1) are transmitted through an X-ray exposure subjecting mask (3') and irradiated upon an X-ray exposure subjecting substrate (5), and in which a pattern (10) shape provided on said mask is transferred onto said substrate, said method for exposing X-rays comprising positioning a stop (11) between said X-ray source and said substrate, said stop being separated from said exposure subjecting pattern of the mask, and intercepting the incident X-rays to the portion other than the exposure portion (Ex) on said substrate surface.
Claim 2
Independent Claim
96 words
A method for X-ray exposure in which the X-rays radiated from an X-ray source (1) are transmitted through an X-ray exposure subjecting mask (3') and irradiated upon an X-ray exposure subjecting substrate (5), and in which a pattern (10) shape provided on said mask is transferred onto said substrate, said method for exposing X-rays comprising positioning a stop (11) between said X-ray source and said substrate, said stop being separated from said exposure subjecting pattern of the mask, and intercepting the incident X-rays to the portion other than the exposure portion (Ex) on said substrate surface.
Claim 3
Independent Claim
92 words
An apparatus for X-ray exposure comprising: an X-ray source (1); an X-ray exposure subjecting mask (3'); means for fixing and moving said source, mask and an X-ray exposure subjecting substrate (5) respectively, said X-rays radiated from said X-ray source being passed through said X-ray exposure subjecting mask and irradiated upon said X-ray exposure subjecting substrate so as to transfer a pattern shape on said mask onto said substrate; and X-ray stop means (11) provided between said X-ray source and said substrate, said stop means being separated from said pattern of the mask.
Claim 4
Independent Claim
92 words
An apparatus for X-ray exposure comprising: an X-ray source (1); an X-ray exposure subjecting mask (3'); means for fixing and moving said source, mask and an X-ray exposure subjecting substrate (5) respectively, said X-rays radiated from said X-ray source being passed through said X-ray exposure subjecting mask and irradiated upon said X-ray exposure subjecting substrate so as to transfer a pattern shape on said mask onto said substrate; and X-ray stop means (11) provided between said X-ray source and said substrate, said stop means being separated from said pattern of the mask.
Claim 5
Dependent Claim
39 words
An apparatus for X-ray exposure according to claim 2, in which said stop means is so constructed as to intercept the X-rays passing through a portion other than said pattern provided on said mask for transferring said pattern shape.
Claim 6
Dependent Claim
45 words
An apparatus for X-ray exposure according to claim 3, in which said stop means is provided on an area of said mask other than another area on which said pattern for transferring is positioned, and in which said stop means is fixed to said mask.
Claim 7
Dependent Claim
24 words
An apparatus for X-ray exposure according to claim 2, in which said stop means has both functions of a back ring and a stop.
Claim 8
Dependent Claim
24 words
An apparatus for X-ray exposure according to claim 2, in which said stop means has both functions of a supporting ring and a stop.
Claim 9
Dependent Claim
23 words
An apparatus for X-ray exposure according to claim 2, in which said stop means is formed by attaching a stop to a membrane.
References Cited (Backward Citations)
No citation records indexed.
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