EP0136130A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method of making articles using gas functionalized plasma developed layer
Assignee: AT&T Inc
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Filing: 1984-09-07
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Granted: —
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Expires: 2004-09-07
Abstract
Abstract This invention concerns a method of making articles by the use of a resist comprising an organic layer, developed by a plasma atmosphere, for pattern delineation. The resist is formed by sorption of an inorganic-containing gas (MR) into an organic material. The development of the resist occurs by exposure to a plasma (e.g. oxygen reactive ion etching) that forms a protective compound (MY) (e.g. a metal oxide) selectively in the resist. The selected regions can be defined by patterning radiation of various types, including visible, ultraviolet, electron beam and ion beam. In an alternative embodiment, the selected regions are defined by an overlying resist, with the gas sorption protecting the unterlying layer in a bilevel resist. The protective compound can protect the organic resist layer during etching of any underlying inorganic layer, such as metal, silicide, oxide, nitride, etc.
Inventors
- 👤 Larry Edward Stillwagon
- 👤 Gary Newton Taylor
- 👤 Thirumalai Nallan Chakravarthy Venkatesan
- 👤 Thomas Michael Wolf
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-29 22:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/36; H; H10; H10P; H10P95/00; G03F7/265
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
92 words
A method of making an article including at least one pattern delineation step including providing a device precursor that includes at least one organic layer and selectively removing by exposure to a plasma a portion of said device precursor CHARACTERISED BY sorbing a gas (MR) containing an inorganic species (M) into said layer and forming a protective compound (MY) comprising said inorganic species in at least a portion of said layer, the portion of the device precursor that is selectively removed being a portion that is not protected by said protective compound.
Claim 2
Independent Claim
92 words
A method of making an article including at least one pattern delineation step including providing a device precursor that includes at least one organic layer and selectively removing by exposure to a plasma a portion of said device precursor CHARACTERISED BY sorbing a gas (MR) containing an inorganic species (M) into said layer and forming a protective compound (MY) comprising said inorganic species in at least a portion of said layer, the portion of the device precursor that is selectively removed being a portion that is not protected by said protective compound.
Claim 3
Dependent Claim
38 words
A method according to claim 1, CHARACTERISED IN THAT said protective compound is formed at least in part by said exposure to a plasma, whereby said protectived compound comprises at least one element (Y) derived from said plasma.
Claim 4
Dependent Claim
59 words
A method according to claim 1 or claim 2 CHARACTERISED BY selectively irradiating said layer with actinic radiation before said sorbing of said gas, whereby the sorbed gas reacts with irradiated portions of said layer, and thereafter substantially removing the unreacted gas from said organic layer, whereby said protective compound is formed in the irradiated portions of said layer.
Claim 5
Dependent Claim
59 words
A method according to claim 1 or claim 2 CHARACTERISED BY selectively irradiating said layer with actinic radiation before said sorbing of said gas, whereby the sorbed gas reacts with unirradiated portions of said layer, and thereafter substantially removing the unreacted gas from said organic layer, whereby said protective compound is formed in the unirradiated portions of said layer.
Claim 6
Dependent Claim
65 words
A method according to claim 1 or claim 2 CHARACTERISED BY selectively irradiating said layer with actinic radiation during or after said sorbing of said gas, thereby causing the sorbed gas to react with the irradiated portions of said organic layer, and thereafter substantially removing the unreacted gas from said organic layer, whereby said protective compound is formed in the irradiated portions of said layer.
Claim 7
Dependent Claim
53 words
A method according to claim 1 or claim 2 CHARACTERISED BY selectively irradiating said layer with actinic radiation during or after said sorbing of said gas, whereby the inorganic species is removed from the irradiated portions of said organic layer, whereby said protective compound is formed in the unirradiated portions of said layer.
Claim 8
Dependent Claim
53 words
A method according to claim 1 or claim 2 CHARACTERISED IN THAT said organic layer is an underlying layer in a multilevel resist, wherein a pattern is formed in an overlying layer, and said sorbing a gas is accomplished in portions of said underlying organic layer where said overlying layer has been removed.
Claim 9
Independent Claim
23 words
A method according to any of the preceding claims CHARACTERISED IN THAT said inorganic species is silicon, germanium, tin, lead, titanium or boron.
Claim 10
Independent Claim
19 words
A method according to any of the preceding claims CHARACTERISED IN THAT said inorganic species is a true metal.
Claim 11
Independent Claim
29 words
A method according to any of the preceding claims CHARACTERISED IN THAT said plasma comprises oxygen, wherein an oxide of said inorganic species is formed as said protective compound.
Claim 12
Independent Claim
28 words
A method according to any of the preceding claims CHARACTERISED IN THAT said gas is substantially sorbed only in a surface or near-surface region of said organic layer.
Claim 13
Independent Claim
26 words
A method according to any of claims 1 to 10 CHARACTERISED IN THAT said gas is substantially sorbed through the full thickness of said organic layer.
Claim 14
Independent Claim
40 words
A method according to any of the preceding claims CHARACTERISED IN THAT said organic layer comprises a group that reacts with said inorganic species to form a complex that is thereafter hydrolyzed, thereby at least partially forming said protective compound.
Claim 15
Dependent Claim
18 words
A method according to claim 13, CHARACTERISED IN THAT said group is an azide or an inorganic halide.
Claim 16
Independent Claim
39 words
A method according to any of the preceding claims CHARACTERISED BY exposing said organic layer to a gas that reacts with water to produce gaseous products, thereby controlling the amount of water on a surface of said organic layer.
Claim 17
Independent Claim
25 words
A method according to any of the preceding claims CHARACTERISED IN THAT said portion that is removed is an unprotected portion of said organic layer.
Claim 18
Independent Claim
24 words
A method according to any of claims 1 to 6 CHARACTERISED IN THAT said organic layer is an overlying layer in a multilevel resist.
Claim 19
Dependent Claim
22 words
A method according to claim 17 CHARACTERISED IN THAT said portion that is removed is from a region underlying said organic layer.
References Cited (Backward Citations)
No citation records indexed.
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