Aqueous developable negative resist compositions

Claim 2

An aqueous developable negative resist composition, comprising a solution of a sensitizer and a polymer system, the polymer system comprising a phenolic resin having a weight average molecular weight of at least about 7,000 and a novolak-type resin compatible with the phenolic resin, the sensitizer comprising a compound selected from the group consisting of bisarylazides, monoarylazides and mixtures thereof, the solution having a total solids content of at least about 15%.

Claim 3

The composition of claim 1 wherein the phenolic resin is the represented by the following structural formula: wherein A is a covalent bond, -O-, -CH 2 -, -OC(O)-, -C(O)O-, or -C(O)OCH 2 -, and R 1 is -H, -F, -Cl, -Br or -I.

Claim 4

The composition of claim 1 wherein the phenolic resin is present in the composition in an amount of from about 10% to about 95% by weight of the polymer system in the composition.

Claim 5

The composition of claim 1 wherein the novolak-type resin is a cresol-formaldehyde novolak resin or a phenol-formaldehyde novolak resin.

Claim 6

The composition of claim 1 wherein the novolak-type resin is present in an amount of from about 5 to about 90% by weight of the polymer system in the composition.

Claim 7

6, The composition of claim 1 wherein the sensitizer is selected from the group consisting of and mixtures thereof, wherein: L is a covalent bond, -CH2-, -CH=CH-, -C(CH 3 ) 2 -, -SO 2 -, -CO-, -O-, or -S-, M is a covalent bond, -o-, -S-, -S0 2 -, -CH 2 -, -CH= CH -, - CH =CH-C O -, -CO-, or -C(CH 3 ) 2 -, R 4 , R 5 , R 6 , R 7 , R 8 ; R 9 and R 10 are selected independently from -H and -N 3 , provided that R4≠R5, and provided that R 6 and R 7 cannot be -N 3 at the same time, R 8 and R 9 cannot be -N 3 at the same time and at least one of R 6 , R 7 , R 8 and R 9 is -N 3 , and R 11 is -H or monovalent C 1 to C 9 alkyl.

Claim 8

The composition of claim 1 wherein the sensitizer is present in an amount of from about 4% by weight of the total solids in the composition up to the saturation point of the sensitizer.

Claim 9

The composition of claim 1 wherein the solvent is selected from the group consisting of aliphatic ketones, aliphatic esters, alkylene glycol monoalkyl ethers, dialkylene glycol monoalkyl ethers, alkylene glycol dialkyl ethers, and mixtures thereof.

Claim 10

The composition of claim 1 wherein the total solids content of the composition is within the range of from about 15% to about 40%.

Claim 11

A deep ultra violet sensitive, aqueous developable negative resist composition, comprising a solution of a deep ultra violet sensitizer and a polymer system, the polymer system comprising a phenolic resin having a weight average molecular weight of at least about 7,000, and a novolak-type resin compatible with the phenolic resin, the phenolic resin is represented by the following structural formula: wherein: A is a covalent bond, -O-, . -CH 2 -, -OC(O)-, -C(O)O-, or -C(0)OCH 2 -, and R 1 is -H, -F, -Cl, -Br or -I, the phenolic resin is present in an amount of from about 10% to about 95% by weight of the polymer system in the composition, the novolak-type resin is present in an amount of from about 15% to about 90% by weight of the polymer system in the composition, the deep ultra violet sensitizer is a compound selected from the group consisting of and mixtures thereof, wherein: Q and T are selected independently from -CH 2 -, -C(CH 3 ) 2 -, -SO 2 -, -CO-, -0-, and -S-, and R 4 , R 5 , R 6 , R 7 , R 8 , and R 9 are selected independently from -H and -N 3 , provided that R4≠R5, and provided that R 6 and R 7 cannot be -N 3 at the same time, R 8 and R 9 cannot be -N 3 at the same time and at least one of R 6 , R 7 , R 8 and R 9 is -N 3 , the sensitizer is present in an amount of about 4% by weight of the total solids in the composition up to the saturation point of the sensitizer, the solvent is a mixture of ethylcellosolve acetate, butyl acetate, and xylene, and the composition has a total solids content of from about 15% to about 40%.

Claim 12

A deep ultra violet sensitive, aqueous developable negative resist composition, comprising a solution of a deep ultra violet sensitizer and a polymer system, the polymer system comprising a phenolic resin having a weight average molecular weight of at least about 7,000, and a novolak-type resin compatible with the phenolic resin, the phenolic resin is represented by the following structural formula: wherein: A is a covalent bond, -O-, . -CH 2 -, -OC(O)-, -C(O)O-, or -C(0)OCH 2 -, and R 1 is -H, -F, -Cl, -Br or -I, the phenolic resin is present in an amount of from about 10% to about 95% by weight of the polymer system in the composition, the novolak-type resin is present in an amount of from about 15% to about 90% by weight of the polymer system in the composition, the deep ultra violet sensitizer is a compound selected from the group consisting of and mixtures thereof, wherein: Q and T are selected independently from -CH 2 -, -C(CH 3 ) 2 -, -SO 2 -, -CO-, -0-, and -S-, and R 4 , R 5 , R 6 , R 7 , R 8 , and R 9 are selected independently from -H and -N 3 , provided that R4≠R5, and provided that R 6 and R 7 cannot be -N 3 at the same time, R 8 and R 9 cannot be -N 3 at the same time and at least one of R 6 , R 7 , R 8 and R 9 is -N 3 , the sensitizer is present in an amount of about 4% by weight of the total solids in the composition up to the saturation point of the sensitizer, the solvent is a mixture of ethylcellosolve acetate, butyl acetate, and xylene, and the composition has a total solids content of from about 15% to about 40%.