EP0118291A2
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EP
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Photoresist composition containing a novolak resin
Assignee: Sumitomo Chemical Co Ltd
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Filing: 1984-03-02
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Granted: —
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Expires: 2004-03-02
Abstract
Abstract A positive type photoresist composition comprises (a) a novolak resin and (b) a quinonediazide compound in wt. ratio of 1:1 to 6:1. The novolak resin is obtained by the addition condensation of a phenol and formaldehyde, in one stage by using as a catalyst an organic acid salt of a divalent metal more electropositive than hydrogen, or in two stages by using the acid catalyst in the subsequent stage, the phenol being at least one compound of formula: wherein R is hydrogen or C1-4 alkyl group and being such that the average C number in the substituent per phenol nucleus is 0.5 to 1.5 and less than 50 mol% of the molecules have substituents at the ortho- or para-position with respect to the -OH group. Preferred salts are acetates of Mg, Mn, Zn, Cd, Co, and Pb. NMR spectra are shown of the resins. The composition in solvent is coated on a support, and has a good resolving power.
Inventors
- 👤 Akihiro Furuta
- 👤 Makoto Hanabata
- 👤 Seimei Yasui
- 👤 Osamu Hiroaki
- 👤 Naoyoshi Jinno
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 04:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/22; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
125 words
A positive type photoresist composition comprising a novolak resin and a quinonediazide compound, said novolak resin being one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: wherein R is hydrogen or an alkyl group of carbon number 1 to 4, said compound being such that the average carbon number in the substitutent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho-or para-position with respect to the hydroxyl group account for less than 50 mol%.
Claim 2
Dependent Claim
125 words
A positive type photoresist composition comprising a novolak resin and a quinonediazide compound, said novolak resin being one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, said phenol being at least one compound represented by the formula: wherein R is hydrogen or an alkyl group of carbon number 1 to 4, said compound being such that the average carbon number in the substitutent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho-or para-position with respect to the hydroxyl group account for less than 50 mol%.
Claim 3
Dependent Claim
147 words
A positive type photoresist composition comprising a novolak resin and a quinonediazide compound, said novolak resin being one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst, said phenol being at least one compound represented by the formula wherein R is hydrogen or an alkyl group of carbon number 1 to 4, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol%.
Claim 4
Dependent Claim
147 words
A positive type photoresist composition comprising a novolak resin and a quinonediazide compound, said novolak resin being one which is obtained by the partial addition condensation reaction of a phenol and formaldehyde which is performed at pH 4 to 7 by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, and by the subsequent addition condensation reaction which is performed at pH 4 or below by using an acid catalyst, said phenol being at least one compound represented by the formula wherein R is hydrogen or an alkyl group of carbon number 1 to 4, said compound being such that the average carbon number in the substituent per one phenol nucleus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol%.
Claim 5
Dependent Claim
20 words
A photoresist composition as claimed in Claim 1, or 2 wherein the phenol contains more than 95 mol% of m-cresol.
Claim 6
Dependent Claim
29 words
A photoresist composition as claimed in Claim 1, 2 or 3, wherein the divalent metal in the catalyst is barium, strontium, calcium, magnesium, manganese, zinc, cadium, cobalt or lead.
Claim 7
Dependent Claim
20 words
A photoresist composition as claimed in Claim 4, wherein the divalent metal is magnesium, manganese, zinc, cadium, cobalt or lead.
Claim 8
Dependent Claim
14 words
A photoresist composition as claimed in Claim 5, wherein the divalent metal is zinc.
Claim 9
Dependent Claim
24 words
A photoresist composition as claimed in any preceding claim, wherein the organic acid salt is an acetate, a formate, a lactate or a benzoate.
Claim 10
Dependent Claim
16 words
A photoresist composition as claimed in Claim 7, wherein the organic acid salt is an acetate.
Claim 11
Dependent Claim
27 words
A photoresist composition as claimed in any preceding claim, wherein the divalent metal salt was used in amount of 0.1 to 5 weight percent of the phenol.
Claim 12
Dependent Claim
39 words
A photoresist composition as claimed in any preceding claim; wherein the novolak resin has a molecular weight of 3000 to 8000 when obtained by the process of Claim 1 or 3000 to 20,000 by the process of Claim 2.
References Cited (Backward Citations)
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