EP0116940A2
Expired / Lapsed
EP
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Pattern transfer device and method
Assignee: Toshiba Corp
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Filing: 1984-02-14
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Granted: —
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Expires: 2004-02-14
Abstract
Abstract For the manufacture of photomasks or in order to draw a pattern on a semiconductor wafer, a step-and-repeat procedure is used. In a step-and-repeat pattern transfer device, the length of a lens barrel (1) is varied so that the reduction of a pattern original (5) is finely adjusted so that the size errors of the pattern may be corrected. The fine adjustment of the reduction is made to such an extent that the expansion of the semiconductor wafer (3) or the like may be compensated for. In order to vary the length of the lens barrel (1), an adjustment means (8) such as a piezoelectric element or electric motor is incorporated in the lens barrel.
Inventors
- 👤 Kuniya Shimazaki
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-28 20:04
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
58 words
A pattern transfer device for reducing and transferring a pattern by a step-and-repeat procedure, characterized by a reduction ratio adjustment means (8) for making fine adjustment of the reduction of said pattern in accordance with dimensional changes of an object (3) upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
Claim 2
Dependent Claim
58 words
A pattern transfer device for reducing and transferring a pattern by a step-and-repeat procedure, characterized by a reduction ratio adjustment means (8) for making fine adjustment of the reduction of said pattern in accordance with dimensional changes of an object (3) upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
Claim 3
Dependent Claim
85 words
A pattern transfer device for reducing and transferring a pattern by a step-and-repeat procedure, characterized by: a pattern position detection means (10,11) for detecting the position of the pattern transferred on an object (3) and obtaining a step position error; and a reduction ratio adjustment means (8) for making the fine adjustment of the reduction of said pattern in response to the step position error detected by said pattern position detection means, thereby adjusting the size of a pattern to be transferred on said object.
Claim 4
Dependent Claim
85 words
A pattern transfer device for reducing and transferring a pattern by a step-and-repeat procedure, characterized by: a pattern position detection means (10,11) for detecting the position of the pattern transferred on an object (3) and obtaining a step position error; and a reduction ratio adjustment means (8) for making the fine adjustment of the reduction of said pattern in response to the step position error detected by said pattern position detection means, thereby adjusting the size of a pattern to be transferred on said object.
Claim 5
Dependent Claim
27 words
A pattern transfer device according to claim 1 or 2 characterised in that said reduction ratio adjustment means (8) is deformable in response to an electrical input.
Claim 6
Dependent Claim
21 words
A pattern transfer device according to claim 3 characterized in that said reduction ratio adjustment means (8) comprises a piezoelectric element.
Claim 7
Dependent Claim
22 words
A pattern transfer device according to claim 1 or 2 characterized in that said reduction ratio adjustment means comprises an electric motor.
Claim 8
Dependent Claim
56 words
A pattern transfer method in which a pattern is reduced and transferred on an object (3) by a step-and-repeat procedure, characterized by making fine adjustment of the reduction of said pattern in accordance with dimensional changes of said object upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
Claim 9
Dependent Claim
56 words
A pattern transfer method in which a pattern is reduced and transferred on an object (3) by a step-and-repeat procedure, characterized by making fine adjustment of the reduction of said pattern in accordance with dimensional changes of said object upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
Claim 10
Dependent Claim
15 words
An object having a pattern which was tranferred thereto using the method of claim 6.
Claim 11
Dependent Claim
16 words
An object according to claim 7 wherein said object is a semiconductor wafer or a photomask.
Claim 12
Dependent Claim
67 words
A pattern transfer device of the type in which a pattern is reduced and transferred by a step-and-repeat procedure, characterized by the provision of a reduction ratio adjustment means for making the fine adjustment of the reduction of said pattern in response to the coefficient of expansion of an object upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
Claim 13
Dependent Claim
67 words
A pattern transfer device of the type in which a pattern is reduced and transferred by a step-and-repeat procedure, characterized by the provision of a reduction ratio adjustment means for making the fine adjustment of the reduction of said pattern in response to the coefficient of expansion of an object upon which is transferred said pattern, thereby adjusting the size of each pattern transferred on said object.
References Cited (Backward Citations)
No citation records indexed.
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