EP0109193A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
X-ray lithographic system
Assignee: Hitachi Ltd
•
Filing: 1983-10-14
•
Granted: —
•
Expires: 2003-10-14
Abstract
Abstract An X-ray lithographic system has a convex mirror (51) onto which flux (54') of synchrotron radiation (54) is incident. The flux (54') is reflected by the mirror (51) onto a radiation sensitive film on a wafer (56). The mirror (51) is rotatively oscillated about an axis (52) to vary the angles of incidence of the flux (54') on the mirror (51) and hence vary the positions on the wafer (56) to which various components (54'a, 54'b) are reflected. In this way a more uniform distribution is achieved in the exposure of the film (56), making the system suitable for exposing relatively large semiconductor wafers.
Inventors
- 👤 Takashi Kimura
- 👤 Hidehito Obayashi
- 👤 Kozo Mochiji
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 22:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70075; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
63 words
An X-ray lithographic system having a convex reflector (51) in the path of radiation flux (54) from means (53) determining the cross-sectional area of the radiation flux (54') to a radiation sensitive object (56); characterised in that: the convex reflector (51) is movable relative to the radiation flux (54) to vary the angles of incidence of the flux (54') on the reflector (51).
Claim 2
Dependent Claim
63 words
An X-ray lithographic system having a convex reflector (51) in the path of radiation flux (54) from means (53) determining the cross-sectional area of the radiation flux (54') to a radiation sensitive object (56); characterised in that: the convex reflector (51) is movable relative to the radiation flux (54) to vary the angles of incidence of the flux (54') on the reflector (51).
Claim 3
Dependent Claim
43 words
An X-ray lithographic system according to claim 1 wherein the convex reflector (51) is movable relative to the flux 54 by rotation or rotary oscillation about an axis (52) which is eccentric relative to the centre of curvature of the convex reflector (51).
Claim 4
Dependent Claim
39 words
An X-ray lithographic system according to claim 2, wherein the convex reflector (51) has a reflecting surface in the form of part of a cylinder, the axis (52) being parallel to the lon g tudinal axis of the cylinder.
Claim 5
Dependent Claim
26 words
An X-ray lithographic system according to claim 2, wherein the convex reflector (51) has a reflecting surface in the form of a part of a sphere.
Claim 6
Dependent Claim
30 words
An X-ray lithographic system according to any one of claims 2 to 4, wherein the axis (52) is substantially perpendicular to the direction of incidence of the radiation flux (54).
Claim 7
Dependent Claim
28 words
An X-ray lithographic system according to any one of claims 2 to 5 wherein the axis (52) lies within the projected cross section of the radiation flux (54').
Claim 8
Dependent Claim
40 words
An X-ray lithographic system according to any one of claims 2 to 6 wherein the axis (52) is at or adjacent a point on the surface of the reflector (51) at which an edge (54'a) of the flux (54')is incident.
Claim 9
Dependent Claim
27 words
An X-ray lithographic system according to any one of the preceding claims having a mask with a predetermined pattern between the reflector (51) and the object (56).
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.