EP0104870A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Low emissivity coatings on transparent substrates
Assignee: Pilkington Group Ltd
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Filing: 1983-09-20
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Granted: —
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Expires: 2003-09-20
Abstract
Abstract A low emissivity coating on a transparent substrate of glass or plastics material is produced by cathode sputtering a layer of silver and thereafter reactively sputtering an anti-reflection metal oxide layer over the silver in the presence of oxygen or an oxidising gas, wherein a small amount of an additional metal other than silver is sputtered onto the silver before the overlying anti-reflection metal oxide layer is applied. The process produces a new low emissivity coated product comprising a glass or plastics substrate with a low emissivity coating comprising a silver layer, a small amount of additional metal dispersed non-uniformly in the silver layer and possibly extending over the silver layer, and an overlying anti-reflection metal oxide coating.
Inventors
- 👤 Frederick Harry Hart
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-09 00:44
CPC Classifications
G; G02; G02B; G02B5/00; G02B5/20; G02B5/28; G02B5/285; C; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3615; C03C17/3644; C03C17/3652; C03C17/3657; C03C17/366; C03C17/3681; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/083; C23C14/086; C23C14/14; C23C14/18; C23C14/20; G02B1/00; G02B1/10; G02B1/11; G02B1/113; G02B1/115; G02B1/116; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12535
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
95 words
A process for the production of a low enissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering an additional metal or metals other than silver in an amount equivalent to a layer 0.5 to 10 nm thick onto the silver and (iii) reactively sputtering, in the presence of oxygen or an cxidising gas, an anti-reflection metal oxide layer or layers over the silver and additional metal.
Claim 2
Dependent Claim
95 words
A process for the production of a low enissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence, (i) sputtering a layer of silver from 5 to 30 nm thick onto the transparent glass or plastics substrate (ii) sputtering an additional metal or metals other than silver in an amount equivalent to a layer 0.5 to 10 nm thick onto the silver and (iii) reactively sputtering, in the presence of oxygen or an cxidising gas, an anti-reflection metal oxide layer or layers over the silver and additional metal.
Claim 3
Dependent Claim
33 words
A process according to Claim 1 wherein the or each additional metal is a metal which forms a colourless metal oxide on subsequent reactive sputtering of the anti-reflection metal oxide layer or layers.
Claim 4
Dependent Claim
12 words
A process according to Claim 1 wherein the additional metal. is copper.
Claim 5
Dependent Claim
30 words
A process according to any of the preceding claims wherein additional metal is sputtered onto the silver in a total anount equivalent to a layer 1 to 5 nm thick.
Claim 6
Dependent Claim
21 words
A process according to any of the preceding claims wherein the layer of silver sputtered is 8 to 15 nm thick.
Claim 7
Dependent Claim
39 words
A process according to any of the preceding claims wherein the said or each said anti-reflection metal oxide layer is a layer of tin oxide, titaniun oxide, indium oxide (optionally doped with tin oxide), bisnuth oxide or zirconium oxide.
Claim 8
Dependent Claim
32 words
A process according to any of the preceding claims wherein the total thickness of the anti-reflection metal oxide layer or layers overlying the silver layer is from 20 nm to 60 nm.
Claim 9
Dependent Claim
28 words
A process according to any of the preceding claims wherein an anti-reflection layer or layers is or are sputtered onto the substrate before sputtering of the silver layer.
Claim 10
Dependent Claim
37 words
A process according to Claim 8 wherein the said or each said anti-reflection layer sputtered before the silver layer is of tin oxide, titaniun oxide, indiun oxide (optionally doped with tin oxide), bismuth oxide or zirconiun oxide.
Claim 11
Dependent Claim
33 words
A process according to Claim 8 or Claim 9 wherein the total thickness of the anti-reflection metal oxide layer or layers sputtered before the silver layer is from 20 nm to 60 nm.
Claim 12
Dependent Claim
122 words
11 . A process for the production of a low emissivity coating on a transparent substrate of glass by cathode sputtering comprising (a) depositing an anti-reflection layer of Sn0 2 30 to 50 nm thick onto the glass substrate by reactive sputtering of tin in the presence of oxygen or an oxidising gas; (b) sputtering a layer of silver 8 to 12 nm thick onto said anti-reflection layer; (c) sputtering copper in an amount equivalent to a layer of copper 1 to 5 nm thick onto said silver layer; and thereafter .(d) depositing on the coating so formed an-anti-reflection layer of Sn0 2 30 to 50 nm thick by reactive sputtering of tin in the presence of oxygen or an oxidising gas.
Claim 13
Dependent Claim
122 words
11 . A process for the production of a low emissivity coating on a transparent substrate of glass by cathode sputtering comprising (a) depositing an anti-reflection layer of Sn0 2 30 to 50 nm thick onto the glass substrate by reactive sputtering of tin in the presence of oxygen or an oxidising gas; (b) sputtering a layer of silver 8 to 12 nm thick onto said anti-reflection layer; (c) sputtering copper in an amount equivalent to a layer of copper 1 to 5 nm thick onto said silver layer; and thereafter .(d) depositing on the coating so formed an-anti-reflection layer of Sn0 2 30 to 50 nm thick by reactive sputtering of tin in the presence of oxygen or an oxidising gas.
Claim 14
Dependent Claim
18 words
A process according to any of the preceding claims wherein the sputtering processes are aided by magnetic enhancement.
Claim 15
Dependent Claim
32 words
A coated glass or plastics sheet having an emissivity of 0.2 or less and a light transmission of at least 70% produced by a process according to any of the preceding claims.
Claim 16
Dependent Claim
87 words
A glass or plastics substrate coated with a low emissivity coating comprising (a) a silver layer 5 to 50 nm thick (b) an additional metal or metals in a total amount equivalent to a metal layer from 0.5 to 10 nm thick, said additional metal or metals being dispersed non-uniformly in the silver layer so that the concentration of additional metal or metals in the silver is a maximum in the upper half of the silver layer, and (c) an overlying anti-reflection metal oxide layer or layers.
Claim 17
Dependent Claim
87 words
A glass or plastics substrate coated with a low emissivity coating comprising (a) a silver layer 5 to 50 nm thick (b) an additional metal or metals in a total amount equivalent to a metal layer from 0.5 to 10 nm thick, said additional metal or metals being dispersed non-uniformly in the silver layer so that the concentration of additional metal or metals in the silver is a maximum in the upper half of the silver layer, and (c) an overlying anti-reflection metal oxide layer or layers.
Claim 18
Dependent Claim
29 words
A coated substrate according to Claim 14 wherein any additional metal is not wholly dispersed in the silver layer but extends over the upper surface of the silver layer.
Claim 19
Dependent Claim
25 words
A. coated substrate according to Claim 14 or Claim 15 wherein the or each additional metal is a metal which forms a colourless metal oxide.
Claim 20
Dependent Claim
16 words
A coated substrate according to Claim 14 or Claim 15 wherein the additional metal is copper.
Claim 21
Dependent Claim
21 words
A coated substrate according to any of Claims 14 to 17 wherein the silver layer is 8 to 15 nm thick.
Claim 22
Dependent Claim
31 words
A coated substrate according to any of Claims 14 to 18 wherein the total amount of additional metal or metals is equivalent to a metal layer 1 to 5 nm thick.
Claim 23
Dependent Claim
41 words
A coated substrate according to any of Claims 14 to 19, wherein the said or each said anti-reflection metal oxide layer is a layer of tin oxide, titanium oxide, indium oxide (optionally doped with tin oxide), bismuth oxide or zirconium oxide.
Claim 24
Dependent Claim
34 words
A coated substrate according to any of Claims 14 to 20, wherein the total thickness of the anti-reflection metal oxide layer or layers overlying the silver layer is from 20 nm to 60 nm.
Claim 25
Dependent Claim
23 words
A coated substrate according to any of Claims 14 to 21 which additionally comprises an anti-reflection layer or layers under the silver layer.
Claim 26
Dependent Claim
39 words
A coated substrate according to Claim 22 wherein the said or each said anti-reflection layer under the silver layer is a layer of tin oxide, titanium oxide, indium oxide (optionally doped with tin oxide), bismuth oxide or zirconium oxide.
Claim 27
Dependent Claim
31 words
A coated substrate according to Claim 22 or Claim 23 wherein the total thickness of the anti-reflection layer or layers under the silver layer is from 20 nm to 60 nm.
Claim 28
Dependent Claim
88 words
A glass substrate with a low emissivity coating comprising, in order, (a) an anti-reflection layer of SnO 2 30 to 50 nm thick (b) a layer of silver 8 to 12 nm thick (c) sufficient copper to provide a copper layer 1 to 5 nm thick, said copper being dispersed in the silver layer so that the concentration of copper in the silver is at a maximum in the upper half of the silver layer and (d) an anti-reflection layer of Sn0 2 30 to 50 nm thick.
Claim 29
Dependent Claim
88 words
A glass substrate with a low emissivity coating comprising, in order, (a) an anti-reflection layer of SnO 2 30 to 50 nm thick (b) a layer of silver 8 to 12 nm thick (c) sufficient copper to provide a copper layer 1 to 5 nm thick, said copper being dispersed in the silver layer so that the concentration of copper in the silver is at a maximum in the upper half of the silver layer and (d) an anti-reflection layer of Sn0 2 30 to 50 nm thick.
References Cited (Backward Citations)
No citation records indexed.
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