EP0104818A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Ion implantation device
Assignee: Eaton Corp
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Filing: 1983-09-08
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Granted: —
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Expires: 2003-09-08
Abstract
Abstract A device for neutralizing the positive static charge which tends to build up on a target (24) in an ion implanter (10). A ring (30) is placed in surrounding relation to the ion beam (17) just upstream of the target, and is electrically biased at a relatively low negative potential. Portions of the overscan beams (17b) of the implanter strike the negatively biased ring generating secondary electrons which are then directed to the positively charged target tending to neutralize such charge.
Inventors
- 👤 Monroe Lee King
- 👤 Leroy George Parslow
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-03 01:17
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/026; H01J37/30; H01J37/317; H01J37/3171
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
80 words
An ion implanter (10) including an ion source (12); means (14, 16, 18, 20, 21) for extracting ions from said source and forming said ions into a beam (17); a target (24) disposed in the path of said beam; and means for directing electrons toward said target; characterized in that said directing means comprises a metallic ring (30) disposed upstream of said target and in surrounding relation to said beam, and means electrically biasing said ring to a negative potential.
Claim 2
Dependent Claim
80 words
An ion implanter (10) including an ion source (12); means (14, 16, 18, 20, 21) for extracting ions from said source and forming said ions into a beam (17); a target (24) disposed in the path of said beam; and means for directing electrons toward said target; characterized in that said directing means comprises a metallic ring (30) disposed upstream of said target and in surrounding relation to said beam, and means electrically biasing said ring to a negative potential.
Claim 3
Dependent Claim
63 words
Apparatus as claimed in claim 1, in which said beam (17) includes primary beam elements (17a) which intersect said target, and overscan beam elements (17b) which diverge beyond the outer edge of the target, said ring being disposed in the path of said overscan beam elements whereby said overscan beam elements strike said ring to generate secondary electrons (32) directed toward said target.
Claim 4
Dependent Claim
22 words
Apparatus as claimed in claim 2, in which said ring includes an inner surface (36) which is angled inwardly adjacent the target.
Claim 5
Dependent Claim
31 words
Apparatus as claimed in claims 1, 2 or 3, wherein said ion implanter includes a Faraday Cylinder (28) disposed upstream of said target, said ring being disposed within said Faraday Cylinder.
Claim 6
Dependent Claim
106 words
An ion implanter (10) including an ion source (12); means (14, 16, 18, 20, 21) for extracting ions from said source and forming said ions into a beam (17); a target (24) disposed in the path of said beam; and a cylindrical member (28) disposed with its axis parallel to said beam upstream of said target, said cylinder being electrically biased to a negative potential with respect to said target; characterized by a metallic ring (30) received within said cylindrical member and disposed at or near the end of said cylindrical member nearest to said target, said ring being in electrical contact with said cylindrical member.
Claim 7
Dependent Claim
106 words
An ion implanter (10) including an ion source (12); means (14, 16, 18, 20, 21) for extracting ions from said source and forming said ions into a beam (17); a target (24) disposed in the path of said beam; and a cylindrical member (28) disposed with its axis parallel to said beam upstream of said target, said cylinder being electrically biased to a negative potential with respect to said target; characterized by a metallic ring (30) received within said cylindrical member and disposed at or near the end of said cylindrical member nearest to said target, said ring being in electrical contact with said cylindrical member.
Claim 8
Dependent Claim
70 words
Apparatus as claimed in claim 5, in which said beam (17) includes primary beam elements (17a) which intersect said target, and overscan beam elements (17b) which diverge sufficiently to miss said target, said ring being disposed in the path of said divergent overscan beam elements whereby said overscan beam elements strike said ring thereby generating secondary electrons which are directed toward said target by the electric field biasing said ring.
Claim 9
Dependent Claim
22 words
Apparatus as claimed in claim 6, in which said ring includes an inner surface (36) which is angled inwardly adjacent the target.
References Cited (Backward Citations)
No citation records indexed.
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