EP0103337A1
Expired / Lapsed
EP
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Method of manufacturing a semiconductor device
Assignee: Koninklijke Philips NV
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Filing: 1983-09-06
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Granted: —
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Expires: 2003-09-06
Abstract
Abstract A method of manufacturing a semiconductor device in which a photosensitive lacquer layer (3) which can be developed in a lye solution and which comprises a polymeric material and a sensitizer with a diazo group and a ketone group is formed on a substrate surface (1). After a patterning irradiation, but before development, the lacquer layer (3) is subjected to an intermediate treatment comprising two irradiations, which results in that differences in solubility in lye are obtained in the direction of thickness in the parts (5) of the lacquer layer (3) which were not exposed during the patterning irradiation. In this manner, it is possibile to realise lacquer patterns with different profiles.
Inventors
- 👤 Franciscus Antonius Vollenbroek
- 👤 Elisabeth Jacoba Spiertz
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 17:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/20; G03F7/2022
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
160 words
A method of manufacturing a semiconductor device, in which a substrate surface has formed on it a photosensitive lacquer layer which can be developed in a lye solution an which comprises a polymeric material and a sensitizer with a diazo group and a ketone group, which lacquer layer is exposed to patterning irradiation and is then subjected, but before a lacquer pattern is formed by development, over its entire area to an intermediate treatment, which results in that differences in solubility in lye are obtained in the direction of thickness in parts of the lacquer layer which had not been irradiated, characterised in that in the intermediate treatment a bond between the sensitizer and the polymeric material is formed in a top layer of the lacquer layer by a first irradiation, after which by a second irradiation at least a part of the sensitizer is converted into an acid in parts of the lacquer layer lying below the top layer.
Claim 2
Independent Claim
160 words
A method of manufacturing a semiconductor device, in which a substrate surface has formed on it a photosensitive lacquer layer which can be developed in a lye solution an which comprises a polymeric material and a sensitizer with a diazo group and a ketone group, which lacquer layer is exposed to patterning irradiation and is then subjected, but before a lacquer pattern is formed by development, over its entire area to an intermediate treatment, which results in that differences in solubility in lye are obtained in the direction of thickness in parts of the lacquer layer which had not been irradiated, characterised in that in the intermediate treatment a bond between the sensitizer and the polymeric material is formed in a top layer of the lacquer layer by a first irradiation, after which by a second irradiation at least a part of the sensitizer is converted into an acid in parts of the lacquer layer lying below the top layer.
Claim 3
Dependent Claim
42 words
A method as claimed in Claim 1, characterised in that the first irradiation is carried out with UV radiation which substantially does not comprise radiation of wave lengths larger than 280 nm, whilst during this irradiation the lacquer layer is substantially anhydrous.
Claim 4
Dependent Claim
42 words
A method as claimed in Claim 1 or 2, characterised in that the second irradiation is carried out with UV radiation of wave lengths larger than 280 nm, whilst during this irradiation the lacquer layer is in contact with a water-containing atmosphere.
Claim 5
Independent Claim
48 words
A method as claimed in anyone of the preceding Claims, characterised in that during the intermediate treatment between the first and the second irradiations, a part of the sensitizer that is present in the lacquer layer below the top layer is decomposed by means of a heat treatment.
Claim 6
Dependent Claim
31 words
A mthos as claimed in anyone of the preceding Claims, characterised in that during the patterning irradiation of the photosensitive lacquer layer only surface parts are rendered developable by this irradiation.
References Cited (Backward Citations)
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