Ellipsometers
Abstract
Abstract An ellipsometer system for measuring the thickness of a film as it is being deposited on a substrate in a furnace. The system includes means for projecting a coherent beam through a window in the furnace. There are two reflective surfaces in the furnace on which films are being deposited which reflect the beam through an exit window in the furnace to a sensor located outside of the furnace. The drawings show a furnace (135) containing main substrates (140) and measuring substrates (136, 138). All the substrates are equally and simultaneously coded. A laser source (132) directs a monochromatic beam onto substrate (136) where it is reflected to substrate (138) and thereby out of the furnace. The receiver unit (144) contains a Wollaston prism which splits the light beam into I P , I s beams respectively polarised in perpendicular planes. The Ip, I s beams are detected by suitable detectors in the unit (144) and two electrical signals I P , I B generates. The Ip, I s signals, together with an 1 0 electrical signal representing the intensity of the original laser beam, are fed to an interface (146). The interface (146) provides a signal representing the relative magnitudes of the I P , I s beams to a data processor unit (148). The data processor unit (148) operates according to an alogirthm to convert the I P , I s values to film parameters. The output of unit (148) controls the furnace controller.
Inventors
- 👤 Jean-Claude Andre Chastang
- 👤 Walter William Hildenbrand
- 👤 Menachem Levanoni
Bibliographic Details
Claims Analysis
Total Claims: 10References Cited (Backward Citations)
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