EP0083510A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Lithographic masks
Assignee: ExxonMobil Technology and Engineering Co
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Filing: 1982-12-31
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Granted: —
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Expires: 2002-12-31
Abstract
Abstract Large area random and mosaic arrays of identical submicron microcolumnar (10) structures can be produced on surfaces by directionally ion etching a monolayer film of spherical colloidal particles (2).
Inventors
- 👤 Harry William Deckman
- 👤 John Henry Dunsmuir
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 09:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; B; B41; B41M; B41M5/00; B41M5/24; G03F7/16; G03F7/165; H; H10; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/692
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
33 words
A method of producing a lithographic mask, characterised by coating said substrate with a monolayer of colloidal particles substantially over the entire surface of said substrate, which particles become fixed to said substrate.
Claim 2
Independent Claim
33 words
A method of producing a lithographic mask, characterised by coating said substrate with a monolayer of colloidal particles substantially over the entire surface of said substrate, which particles become fixed to said substrate.
Claim 3
Dependent Claim
31 words
A method according to claim 1 of producing a lithographic mask for forming an etched pattern in said substrate, characterised by the subsequent step of etching a pattern in said substrate.
Claim 4
Dependent Claim
63 words
A method according to claim 1 of producing a lithographic mask which is ordered, characterised in that said step of coating said substrate comprises: (a) depositing a dispersion of colloidal particles onto said substrate to provide a monolayer of colloidal particles thereon; and (b) dispelling any excess of said colloidal particles in said monolayer from said substrate such that said monolayer becomes ordered.
Claim 5
Dependent Claim
26 words
A method according to claim 3 of producing a lithographic mask which is ordered, characterised by the subsequent step of etching a pattern in said substrate.
Claim 6
Dependent Claim
41 words
A method according to claim 1 of producing a lithographic mask for deposition on said substrate, characterised by the step of depositing a metal onto said substrate so as to fill the spaces between said colloidal particles fixed to said substrate.
Claim 7
Independent Claim
17 words
A method according to any preceding claim, characterised in that said particles are monodisperse spherical polymer particles.
Claim 8
Dependent Claim
28 words
A method according to claim 3, claim 4 or claim 6 as appended to claim 3, characterised in that said dispelling step is performed by rotating said substrate.
Claim 9
Dependent Claim
30 words
A method according to claim 7, characterised in that the rotating step is performed at a rotation speed such that a void free single layer of colloidal particles is produced.
Claim 10
Dependent Claim
32 words
A method according to claim 7 of producing a lithographic mask which is ordered, characterised in that the rotating step is performed at a rotation speed greater than 2000 revolutions per minute.
Claim 11
Independent Claim
45 words
A method for producing a spectrally selective absorbing surface, characterised by the steps of coating said substrate with a monolayer of colloidal particles substantially over the entire surface, which particles become fixed to said substrates, and etching a pattern in said substrate of microcolumnar posts.
Claim 12
Independent Claim
45 words
A method for producing a spectrally selective absorbing surface, characterised by the steps of coating said substrate with a monolayer of colloidal particles substantially over the entire surface, which particles become fixed to said substrates, and etching a pattern in said substrate of microcolumnar posts.
References Cited (Backward Citations)
No citation records indexed.
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