EP0073140A2
Expired / Lapsed
EP
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Method and apparatus for inspecting a pattern
Assignee: Fujitsu Ltd
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Filing: 1982-08-19
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Granted: —
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Expires: 2002-08-19
Abstract
Abstract In a method for inspecting a pattern (11) produced by using pattern data of a predetermined reference pattern (11(REF)), comparison is carried out between the pattern (11) reproduced from the scanning signal of the pattern and the pattern produced from the signal of a modified form (11 (MOD)) of the predetermined reference pattern (11 (REF)).
Inventors
- 👤 Shougo Matsui
- 👤 Yoshimitu Mashima
- 👤 Kenichi Kobayashi
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 16:24
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G01; G01N; G01N21/00; G01N21/84; G01N21/88; G01N21/95; G01N21/956; G06; G06T; G06T7/00; G06T7/0002; G06T7/0004; G06T7/001; G06T2207/00; G06T2207/10; G06T2207/10056; G06T2207/30; G06T2207/30108; G06T2207/30148
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
112 words
A method for inspecting a pattern which is produced by using pattern data of a predetermined reference pattern comprising the steps of: scanning the pattern to be inspected to produce a scanning signal of the pattern, reading out the pattern data of the predetermined reference pattern stored in a memory device, processing said read out pattern data of the predetermined reference pattern to provide a signal of a modified form of said predetermined reference pattern, the form corresponding to a permissible pattern which is formed by deleting corners from said reference pattern, and comparing said scanning signal of the pattern and said signal of the modified form of said predetermined reference pattern.
Claim 2
Independent Claim
112 words
A method for inspecting a pattern which is produced by using pattern data of a predetermined reference pattern comprising the steps of: scanning the pattern to be inspected to produce a scanning signal of the pattern, reading out the pattern data of the predetermined reference pattern stored in a memory device, processing said read out pattern data of the predetermined reference pattern to provide a signal of a modified form of said predetermined reference pattern, the form corresponding to a permissible pattern which is formed by deleting corners from said reference pattern, and comparing said scanning signal of the pattern and said signal of the modified form of said predetermined reference pattern.
Claim 3
Dependent Claim
22 words
A method as defined in claim 1, wherein said pattern is a reticle pattern used for producing master masks for semiconductor devices.
Claim 4
Independent Claim
187 words
An apparatus for inspecting a pattern which is produced by using pattern data of a predetermined reference pattern, said apparatus comprising: a scanning means, for scanning the pattern to be inspected, the scanning means having a light source, an image sensor, a stage for placing the pattern, and a driving means for driving the stage, a pattern signal conversion means for receiving signals from said image sensor and generating the scanning signal, a memory means for storing the pattern data of the predetermined reference pattern, a reference pattern signal conversion means for receiving a signal read out from said memory means and generating a pattern signal of said predetermined reference pattern, a signal modifying means for modifying the pattern signal of said predetermined reference pattern and generating a.signal of a modified form of said predetermined reference pattern, the form corresponding to a permissible pattern which is formed by deleting corners from said reference pattern, and a comparator means for comparing the scanning signal from said pattern signal conversion means and the signal of the modified form of said predetermined reference pattern obtained from said signal modifying means.
Claim 5
Independent Claim
187 words
An apparatus for inspecting a pattern which is produced by using pattern data of a predetermined reference pattern, said apparatus comprising: a scanning means, for scanning the pattern to be inspected, the scanning means having a light source, an image sensor, a stage for placing the pattern, and a driving means for driving the stage, a pattern signal conversion means for receiving signals from said image sensor and generating the scanning signal, a memory means for storing the pattern data of the predetermined reference pattern, a reference pattern signal conversion means for receiving a signal read out from said memory means and generating a pattern signal of said predetermined reference pattern, a signal modifying means for modifying the pattern signal of said predetermined reference pattern and generating a.signal of a modified form of said predetermined reference pattern, the form corresponding to a permissible pattern which is formed by deleting corners from said reference pattern, and a comparator means for comparing the scanning signal from said pattern signal conversion means and the signal of the modified form of said predetermined reference pattern obtained from said signal modifying means.
References Cited (Backward Citations)
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