Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
40 words
Apparatus for exposing a photosensitive medium to light at a plurality of different wavelengths to produce an exposed pattern on the element, the apparatus being characterised by comprising a light source consisting of a pulsed rare gas halide excimer laser.
Claim 2
Dependent Claim
40 words
Apparatus for exposing a photosensitive medium to light at a plurality of different wavelengths to produce an exposed pattern on the element, the apparatus being characterised by comprising a light source consisting of a pulsed rare gas halide excimer laser.
Claim 3
Dependent Claim
27 words
Apparatus as claimed in claim l., in which the lasing medium in the laser consists of one or more of ArF, KrCl, KrF, XeBr, XeCl and XeF.
Claim 4
Dependent Claim
30 words
Apparatus as claimed in any preceding claim, in which the photosensitive element medium consists of novolak resin sensitized with a diazo ketone, or poly(methyl methacrylate), or poly (methyl isopropenyl ketone).
Claim 5
Dependent Claim
24 words
Apparatus as claimed in any preceding claim, in which the pulsed rare gas halide excimer laser provides light at a plurality of fundamental wavelengths.
Claim 6
Dependent Claim
40 words
Apparatus as claimed in any preceding claim, in which the light source further comprises a Raman cell interposed between the laser and the photosensitive element, the Raman cell producing light at at least one secondary wavelength by stimulated Raman scattering.
Claim 7
Dependent Claim
33 words
Apparatus as claimed in claim 5, in which the Raman cell produces light at a plurality of secondary wavelengths, each corresponding to the or one of the fundamental wavelengths produced by the laser.
Claim 8
Dependent Claim
18 words
Apparatus as claimed in claim 6, in which the Raman cell contains a plurality of different Raman media.
Claim 9
Dependent Claim
99 words
Method of exposing a photosensitive medium having a known wavelength sensitivity band comprising the steps of: providing a pulsed rare gas halide excimer laser; selecting an excimer medium for said excimer laser which produces a fundamental output of a predetermined wavelength; directing the output of the pulsed excimer laser to a Raman cell to produce at least one secondary wavelength within said known wavelength sensitivity band by stimulated Raman scattering in a suitable Raman medium contained in said Raman cell; and exposing said photosensitive element to the output of said Raman cell to optimize exposure of the photosensitive element.
Claim 10
Dependent Claim
99 words
Method of exposing a photosensitive medium having a known wavelength sensitivity band comprising the steps of: providing a pulsed rare gas halide excimer laser; selecting an excimer medium for said excimer laser which produces a fundamental output of a predetermined wavelength; directing the output of the pulsed excimer laser to a Raman cell to produce at least one secondary wavelength within said known wavelength sensitivity band by stimulated Raman scattering in a suitable Raman medium contained in said Raman cell; and exposing said photosensitive element to the output of said Raman cell to optimize exposure of the photosensitive element.
Claim 11
Dependent Claim
28 words
Method as claimed in claim 8, in which the rare gas halide lasing medium is chosen from the group consisting of ArF, KrCl, KrF, XeBr, XeCl and XeF.
Claim 12
Dependent Claim
30 words
Method as claimed in claim 8 or claim 9, in which the photosensitive medium consists of novolak resin sensitized with a diazo ketone, or poly(methyl methacrylate) or poly(methyl isopropenyl ketone).