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EP0064639B1 Expired / Lapsed EP ⏱️ 0.0 years remaining

Electron-beam lithographic apparatus

Assignee: Toshiba Corp
•
Filing: 1982-04-22
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Granted: 1988-09-07
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Expires: 2002-04-22
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Abstract

No abstract record available.

Inventors

  • 👤 Kiyomi Koyama

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-25 09:07
CPC Classifications
H; H10; H10P; H10P95/00; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3023; H01J37/3026

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 439 words
In an electron beam lithographic apparatus suitable for drawing patterns on an object, whereby the surface of the object is divided into a number of sections, each representing the area which can be scanned by the electron beam, the pattern to be drawn in a given section is decom- osed into a plurality of partial patterns such that the section pattern can be built up from the partial patterns by operating thereon with one or a combination of logical operators, the partial patterns being specified by co-ordinates relative to an orthogonal co-ordinate system on the surface of the object, and the partial pattern co- ordinate data are converted to produce bit patterns stored in pattern memory means, each bit pattern corresponding to a respective partial pattern, but being in a form suitable as input to an electron beam blanking device, an electron beam blanking control system comprising: -means (11, 13a-13c) for generating address data corresponding to a plurality of partial patterns, -pattern memory means (15a-15c, 16a-16c) comprising a plurality of memory storage locations, each specified by an address datum from said address data generating means, for storing bit patterns corresponding to said partial patterns, and -means (20) for effecting blanking of an electron beam according to the bit patterns to thereby draw a pattern on an object, characterized in that -the said means for generating address data includes pattern co-ordinate data memory means (11), in which co-ordinate data of partial patterns of a pattern to be drawn are stored, and a plurality of data converting means (13a-13c), each data converting means being suitable to receive from said pattern co-ordinate data memory means the co-ordinate data for one partial pattern and for converting said co-ordinate data into the respective address data, -a plurality of reading means (18a-18c), equal in number to the number of data converting means (13-13c), is provided for synchronously reading out said bit patterns from said pattern memory means (15a-15c, 16a-16c), -synthesizing means (19), comprising one or a combination of logical operating means, is provided for synthesizing said bit patterns read out from said pattern memory means (15a-15c, 16a-16c) by said reading means (18a-18c) to produce a resultant bit pattern, and -said pattern memory means is constituted by a plurality of paired memories (15a, 16a-15c, 16c), each memory pair being connected to a respective data converting means (13a-13c) and to a respective reading means (18a-18c) via respective switching means (14a-14c, 17a-17c) in such a way that one bit pattern is written to one memory of each memory pair while a previously written bit pattern is being read out from the other memory of the said memory pair.
Claim 2
Dependent Claim 439 words
In an electron beam lithographic apparatus suitable for drawing patterns on an object, whereby the surface of the object is divided into a number of sections, each representing the area which can be scanned by the electron beam, the pattern to be drawn in a given section is decom- osed into a plurality of partial patterns such that the section pattern can be built up from the partial patterns by operating thereon with one or a combination of logical operators, the partial patterns being specified by co-ordinates relative to an orthogonal co-ordinate system on the surface of the object, and the partial pattern co- ordinate data are converted to produce bit patterns stored in pattern memory means, each bit pattern corresponding to a respective partial pattern, but being in a form suitable as input to an electron beam blanking device, an electron beam blanking control system comprising: -means (11, 13a-13c) for generating address data corresponding to a plurality of partial patterns, -pattern memory means (15a-15c, 16a-16c) comprising a plurality of memory storage locations, each specified by an address datum from said address data generating means, for storing bit patterns corresponding to said partial patterns, and -means (20) for effecting blanking of an electron beam according to the bit patterns to thereby draw a pattern on an object, characterized in that -the said means for generating address data includes pattern co-ordinate data memory means (11), in which co-ordinate data of partial patterns of a pattern to be drawn are stored, and a plurality of data converting means (13a-13c), each data converting means being suitable to receive from said pattern co-ordinate data memory means the co-ordinate data for one partial pattern and for converting said co-ordinate data into the respective address data, -a plurality of reading means (18a-18c), equal in number to the number of data converting means (13-13c), is provided for synchronously reading out said bit patterns from said pattern memory means (15a-15c, 16a-16c), -synthesizing means (19), comprising one or a combination of logical operating means, is provided for synthesizing said bit patterns read out from said pattern memory means (15a-15c, 16a-16c) by said reading means (18a-18c) to produce a resultant bit pattern, and -said pattern memory means is constituted by a plurality of paired memories (15a, 16a-15c, 16c), each memory pair being connected to a respective data converting means (13a-13c) and to a respective reading means (18a-18c) via respective switching means (14a-14c, 17a-17c) in such a way that one bit pattern is written to one memory of each memory pair while a previously written bit pattern is being read out from the other memory of the said memory pair.
Claim 3
Dependent Claim 35 words
The electron-beam lithographic apparatus according to claim 1, characterized in that said synthesizing means is constituted by an OR gate (19a) which is supplied with the bit patterns from said reading means (18a to 18c).
Claim 4
Dependent Claim 59 words
The electron-beam lithographic apparatus according to claim 1, characterized in that said synthesizing means (19) includes an OR gate (19a) which is supplied with the bit patterns from said reading means (18a to 18c) and an AND gate (19b) which is supplied with an output bit pattern from said OR gate (19a) and at least one fixed bit pattern.
Claim 5
Dependent Claim 60 words
The electron-beam lithographic apparatus according to claim 1, characterized in that said synthesizing means (19) includes an OR gate (19a) which is supplied with the bit patterns from said reading means (18a to 18c) and an exclusive OR gate (19b) which is supplied with an output bit pattern from said OR gate (19a) and at least one fixed bit pattern.
Claim 6
Dependent Claim 43 words
The electron-beam lithographic apparatus according to claim 1, characterized by further comprising means (25) for generating a fixed bit pattern and means (26) for repeatedly supplying the fixed bit pattern from said fixed bit pattern generating means (25) to said synthesizing means (19).

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