EP0064222A2
Expired / Lapsed
EP
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Process for forming resist patterns
Assignee: Toshiba Corp
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Filing: 1982-04-21
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Granted: —
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Expires: 2002-04-21
Abstract
Abstract Disclosed is a process for forming resist patterns by coating on a substrate at least one selected from homopolymers of a monomer represented by the formula: and copolymers of said monomer with other vinyl monomers, applying radiation to a desired portion thereof, and thereafter carrying out development treatment with use of a developer, which is characterized in that said developer is composed of one or more of ketones selected from the group consisting of 2-butanone, 2-methyl-3-butanone, 2-pentanone, 3-pentanone and 4-methyl-2-pentanone; or mixture thereof with other ketone and/or alcohol, except for a single use of 2-butanone and a combination of 4-methyl-2-pentanone and alcohol.
Inventors
- 👤 Tsukasa Tada
- 👤 Akira Miura
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 17:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/26; G03F7/30; G03F7/32; G03F7/325
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
100 words
In a process for forming resist patterns by coating on a substrate at least one selected from homopolymers of a monomer represented by the formula: and copolymers of said monomer with other vinyl monomers, applying radiation to a desired portion thereof, and thereafter carrying out development treatment with use of a developer; the improvement wherein said developer is composed of one or more of ketones selected from the group consisting of 2-butanone, 2-methyl-3-butanone, 2-pentanone, 3-pentanone and 4-methyl-2-pentanone; or a mixture thereof with other ketone and/or alcohol, except for a single use of 2-butanone and a combination of 4-methyl-2-pentanone and alcohol.
Claim 2
Dependent Claim
100 words
In a process for forming resist patterns by coating on a substrate at least one selected from homopolymers of a monomer represented by the formula: and copolymers of said monomer with other vinyl monomers, applying radiation to a desired portion thereof, and thereafter carrying out development treatment with use of a developer; the improvement wherein said developer is composed of one or more of ketones selected from the group consisting of 2-butanone, 2-methyl-3-butanone, 2-pentanone, 3-pentanone and 4-methyl-2-pentanone; or a mixture thereof with other ketone and/or alcohol, except for a single use of 2-butanone and a combination of 4-methyl-2-pentanone and alcohol.
Claim 3
Dependent Claim
28 words
The process according to Claim 1, wherein said other ketone is selected from the group consisting of 2-heptanone, 3-heptanone, 2-hexanone, 3-hexanone, 2-methyl-5-hexanone, 3-methyl-5-hexanone, 4-methyl-5-hexanone, 3-methyl-2-butanone, 2-methyl-3-pentanone and 3-methyl-2-pentanone.
Claim 4
Dependent Claim
11 words
The process according to Claim 1, wherein said alcohol is 2-propanol.
Claim 5
Dependent Claim
30 words
The process according to Claim 1, wherein the content of 2-butanone, 2-methyl-3-butanone, 2-pentanone, 3-pentanone or 4-methyl-2 - pentanone in the developer ranges from 20 to less than 100% by weight.
Claim 6
Dependent Claim
24 words
The process according to Claim 4, wherein said 2-butanone is contained in the developer in an amount of from 5 to 40% by weight.
Claim 7
Dependent Claim
25 words
6 . The process according to Claim 4, wherein said 2-methyl-3-butanone is contained in the developer in an amount of from 20 to 70%.by weight.
Claim 8
Dependent Claim
28 words
The process according to Claim 4, wherein said 2-pentanone or 3-pentanone is contained in the developer in an amount of from 20 to less than 100% by weight.
Claim 9
Dependent Claim
26 words
The process according to Claim 4, wherein said 4-methyl-2-pentanone is contained in the developer in an amount of from 40 to less than 100% by weight.
Claim 10
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-butanone/2-methyl-3-butanone mixture.
Claim 11
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-butanone/2-methyl-3-butanone/2-propanol mixture.
Claim 12
Dependent Claim
14 words
ll. The process according to Claim 1, wherein said developer is a 3-pentanone/2-methyl-5-hexanone mixture.
Claim 13
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 4-methyl-2-pentanone/2-butanone mixture.
Claim 14
Dependent Claim
11 words
The process according to Claim 1, wherein said developer is 4-methyl-2-pentanone.
Claim 15
Dependent Claim
16 words
1 4 . The process according to Claim 1, wherein said developer is a 2-pentanone/2-heptanone mixture.
Claim 16
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-pentanone/2-methyl-5-hexanone mixture.
Claim 17
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-pentanone/3-methyl-5-hexanone mixture.
Claim 18
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-pentanone/4-methyl-5-hexanone mixture.
Claim 19
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 2-pentanone/2-propanol mixture.
Claim 20
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 3-pentanone/3-heptanone mixture.
Claim 21
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 3-pentanone/3-methyl-5-hexanone mixture.
Claim 22
Dependent Claim
13 words
The process according to Claim 1, wherein said developer is a 3-pentanone/4-methyl-5-hexanone mixture.
Claim 23
Dependent Claim
12 words
The process according to Claim 1, wherein said-developer is a 3-pentanone/2-propanol mixture.
References Cited (Backward Citations)
No citation records indexed.
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