EP0052787A1
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EP
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Etchant composition and application thereof
Assignee: International Business Machines Corp
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Filing: 1981-10-27
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Granted: —
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Expires: 2001-10-27
Abstract
Abstract The etchant composition contains water, an inorganic acid, polyvinyl alcohol in an amount sufficientto improve the uniformity of the etching, and transition metal ions in an amount sufficient to accelerate the etching. The acid is preferably selected from the group of hydrofluoric acid, sulfuric acid, hydrochloric acid or mixtures thereof. The transition metal ions are preferably selected from the group of nickei, cobalt or mixtures thereof. The etchant is especially applicable in etching chrome circuitry lines for integrated circuits where etch masks made of a positive photoresist might be employed.
Inventors
- 👤 Raymond William Angelo
- 👤 Peter Bakos
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 13:33
CPC Classifications
C; C09; C09K; C09K13/00; C09K13/04; C09K13/06; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/26; H; H10; H10P; H10P50/00; H10P50/60; H10P50/66; H10P50/663; H10P50/667
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
43 words
Acidic, aqueous etchant composition containing water and an inorganic acid, characterized in that in addition the composition contains polyvinyl alcohol in an amount sufficient to improve the uniformity of the etching and transition metal ions in an amount sufficient to accelerate the etching.
Claim 2
Dependent Claim
43 words
Acidic, aqueous etchant composition containing water and an inorganic acid, characterized in that in addition the composition contains polyvinyl alcohol in an amount sufficient to improve the uniformity of the etching and transition metal ions in an amount sufficient to accelerate the etching.
Claim 3
Dependent Claim
28 words
Composition according to claim 1, wherein the acid is present in amount of about 2 to 50% by weight, and wherein the P H of the composition is≤5.
Claim 4
Dependent Claim
21 words
Composition according to claim 2, wherein the acid is present in an amount of about 2 to about 20% by weight.
Claim 5
Dependent Claim
20 words
Composition according to any one of claims 1 to 3, wherein the P H is about 0.1 to about 4.5.
Claim 6
Dependent Claim
28 words
Composition according to any one of claims 1 to 4, wherein said acid is selected from the group of hydrofluoric acid, sulfuric acid, hydrochloric acid or mixtures thereof.
Claim 7
Dependent Claim
24 words
Composition according to any one of claims 1 to 5, wherein the amount of polyvinyl alcohol is about 1 to about 25% by weight.
Claim 8
Dependent Claim
18 words
Composition according to any one of claims 1 to 6, wherein said polyvinyl alcohol is cold water soluble.
Claim 9
Dependent Claim
26 words
Composition according to any one of claims 1 to 7, wherein said transition metal ions are selected from the group of nickel, cobalt or mixtures thereof.
Claim 10
Dependent Claim
25 words
Composition according to claim 8, wherein said transition metal ions are from compounds selected from the group of nickel, chloride, cobalt chloride, or mixtures thereof.
Claim 11
Dependent Claim
25 words
Composition according to any one of claims 1 to 9, wherein the amount of transition metal ions is about 0.1 to about 8% by weight.
Claim 12
Dependent Claim
18 words
Application of the method according to any one of claims 1 to 10 for the etching of chrome.
Claim 13
Dependent Claim
32 words
Application according to claim 11, wherein the chrome surface to be etched is contacted with the composition between 10 seconds and 10 minutes at a temperature between room temperature and about 90°C.
References Cited (Backward Citations)
No citation records indexed.
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