EP0046083A2
Expired / Lapsed
EP
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Photolabile blocked surfactants and compositions containing the same
Assignee: 3M Co
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Filing: 1981-08-10
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Granted: —
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Expires: 2001-08-10
Abstract
Abstract Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.
Inventors
- 👤 Gilbert L. Eian
- 👤 John E. Trend
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 17:26
CPC Classifications
C; C09; C09K; C09K23/00; C09K23/12; C09D; C09D5/00; C09D7/00; C09D7/40; C09D7/45; C09J; C09J7/00; C09J7/30; C09J7/38; C09J7/381; C09J7/385; Y; Y10; Y10S; Y10S522/00; Y10S522/904
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
115 words
A compound characterized by the feature of being a photolabile blocked surfactant compound having the general formula (P-X)̵ a R wherein (-X)̵ a R is the hydrogen-eliminated residue of a surfactant having the formula (H-X)̵ a R wherein X is a polar divalent radical; P is a photolabile masking group which prior to exposure to actinic radiation masks the polar properties of X and upon exposure to actinic radiation will unmask the polar properties of X; R is a hydrophobic group which provides in said surfactant (H-X)̵ a R a log (critical micelle concentration) equal to or less than -2; and a is a number from 1 to 4 to satisfy the valency of R.
Claim 2
Dependent Claim
115 words
A compound characterized by the feature of being a photolabile blocked surfactant compound having the general formula (P-X)̵ a R wherein (-X)̵ a R is the hydrogen-eliminated residue of a surfactant having the formula (H-X)̵ a R wherein X is a polar divalent radical; P is a photolabile masking group which prior to exposure to actinic radiation masks the polar properties of X and upon exposure to actinic radiation will unmask the polar properties of X; R is a hydrophobic group which provides in said surfactant (H-X)̵ a R a log (critical micelle concentration) equal to or less than -2; and a is a number from 1 to 4 to satisfy the valency of R.
Claim 3
Dependent Claim
34 words
The photolabile blocked surfactant compound of claim 1 further characterized by X being selected from the group consisting of wherein R 1 is hydrogen or lower alkyl having from 1 to 4 carbon atoms.
Claim 4
Dependent Claim
136 words
The photolabile blocked surfactant of claim 1 further characterized by R being selected from: (a) R 2- wherein R is (1) straight chain alkyl, alkenyl, alkynyl, or alkylphenyl group having 12 to 30 carbon atoms when X is (2) straight chain alkyl, alkenyl, alkynyl, or alkylphenyl group having 15 to 30 carbon atoms when X is in which R is defined above; or (3) a perfluoroalkyl, alkenyl, or -alkynyl group having 7 to 30 carbon atoms; R 3 is a straight chain alkyl, alkenyl, alkynyl, or alkylphenyl group having 11 to 30 carbon atoms or a perfluoroalkyl group having 7 to 30 carbon atoms; R 4 is a straight chain alkyl, alkenyl, alkynyl, alkylphenyl or perfluoroalkyl, -alkenyl, or -alkynyl group having 7 to 30 carbon atoms; and n is 1 or 2; and a is 1.
Claim 5
Dependent Claim
188 words
The photolabile blocked surfactant compound of claim 1 further characterized by having a general formula selected from the group consisting of and wherein Ar is a mononuclear or polynuclear divalent aryl group having 6 to 14 carbon atoms or heteroaromatic group having 5 to 13 carbon atoms with heteroatoms selected from oxygen, nitrogen or sulfur atoms, the nuclei of which may be substituted by one auxochromic or bathromic group; Ar 2 is the same as Ar except that Ar 2 is monovalent; R 5 is hydrogen, lower alky, phenyl, phenyl substituted by an auxochromic or bathochromic group as defined for Ar l , or a lower alkylene group joining CH to Ar and forming a five- or six-membered heterocyclic ring; R 6 is phenyl substituted by 3-alkoxy or 3,5- dialkoxy in which the alkyl group can be a hydrogen atom, a lower alkyl group, having from 1-4 carbon atoms, or a phenyl group; R7 is hydrogen, lower alkyl having from 1-4 carbon atoms, or lower alkylene having 2-4 carbon atoms joining N to Ar 2 forming a 5- or 6-membered heterocyclic ring; and b is zero or one.
Claim 6
Dependent Claim
150 words
A coating composition which is releasable from a substrate upon exposure to actinic radiation comprising an actinic radiation-transmissive thermoplastic organic film-forming binder having blended therein, in a quantity sufficient to release a coating of said binder from a substrate, a compound characterized by being a photolabile blocked surfactant having the general formula (̵P-X)̵ Z R wherein (-X)̵ a R is the hydrogen-eliminated residue of a surfactant having the formula (H-X)̵ a R wherein X is a polar divalent radical; P is a photolabile masking group which prior to exposure to actinic radiation masks the polar properties of X and upon exposure to actinic radiation will unmask the polar properties of X; R is a hydrophobic group which provides in said surfactant (H-X)̵ a R a log (critical micelle concentration) equal to or less than -2; and a is a number from 1 to 4 to satisfy the valency of R.
Claim 7
Dependent Claim
150 words
A coating composition which is releasable from a substrate upon exposure to actinic radiation comprising an actinic radiation-transmissive thermoplastic organic film-forming binder having blended therein, in a quantity sufficient to release a coating of said binder from a substrate, a compound characterized by being a photolabile blocked surfactant having the general formula (̵P-X)̵ Z R wherein (-X)̵ a R is the hydrogen-eliminated residue of a surfactant having the formula (H-X)̵ a R wherein X is a polar divalent radical; P is a photolabile masking group which prior to exposure to actinic radiation masks the polar properties of X and upon exposure to actinic radiation will unmask the polar properties of X; R is a hydrophobic group which provides in said surfactant (H-X)̵ a R a log (critical micelle concentration) equal to or less than -2; and a is a number from 1 to 4 to satisfy the valency of R.
Claim 8
Dependent Claim
19 words
The coating composition of claim 5 wherein the film-forming binder is characterized by being a pressure sensitive adhesive composition.
Claim 9
Dependent Claim
22 words
The coating composition of claim 5 wherein said film-forming binder is further characterized by having a molecular weight of at least 10,000.
Claim 10
Dependent Claim
37 words
The coating composition of claim 5 wherein said film-forming binder is further characterized by being selected from the group consisting of copolyesters based on an acid selected from terephthalic, isophthalic, sebacic, adipic and hexahydrophthalic and mixtures thereof.
Claim 11
Dependent Claim
29 words
The coating composition of claim 5 wherein said film-forming binder is further characterized by being selected from the group consisting of alkyd resins based on phthalic anhydride and glycerine.
Claim 12
Dependent Claim
24 words
The coating composition of claim 5 wherein said film-forming binder is further characterized by being selected from the group consisting of poly(hexameth- yleneadipamide)and poiycarpolactam.
Claim 13
Dependent Claim
44 words
The coating composition of claim 5 wherein said film-forming binder is further characterized by being selecte-d from the group consisting of vinyl acetate copolymers, vinylchloride copolymers, vinylidene chloride copolymers, ethylene copolymers, polyacrylates, cellulose esters, polyvinyl acetals, polyurethanes, polycarbonates, styrene-maleic anhydride and maleic acid copolymers.
Claim 14
Dependent Claim
18 words
The coating composition of claim 5 wherein said composition is further characterized by also including a compatible solvent.
Claim 15
Dependent Claim
31 words
The coating composition of claim 5 wherein said photolabile blocked surfactant compound is further characterized by containing therein at about 1 to 10 parts per 100 parts of said film-forming binder.
Claim 16
Dependent Claim
24 words
The coating composition of claim 12 further characterized by having a solids concentration of about 10 to 50 parts per 100 parts total composition.
Claim 17
Dependent Claim
30 words
The coating composition of claim 12 further characterized by said solvent being selected from the group consisting of ketones, aromatic hydrocarbons, halocarbons, esters, ethers, dioxane, tetrahydrofuran, nitromethane, nitroethane, and acetonitrile.
Claim 18
Dependent Claim
29 words
The coating composition of claim 5 further characterized by also including minor amounts of additives which do not interfere with the releasability of the coating on exposure to radiation.
Claim 19
Dependent Claim
31 words
The coating composition of claim 16 further characterized by said additives being selected from the group consisting of coating aids, wetting agents, ultraviolet absorbers, plasticizers, fillers, pigments, dyes and mixtures thereof.
Claim 20
Dependent Claim
13 words
A substrate characterized by being coated with the coating composition of claim 5.
Claim 21
Dependent Claim
16 words
A coating method characterized by applying the coating composition defined in claim 5 to a substrate.
References Cited (Backward Citations)
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