Patent US3560070A successfully refreshed from Google Patents.
EP0033232A1
Expired / Lapsed
EP
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Developers and methods of processing radiation sensitive plates using the same
Assignee: Agfa Gevaert NV
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Filing: 1981-01-23
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Granted: —
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Expires: 2001-01-23
Abstract
Abstract A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerizable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms. The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates.
Inventors
- 👤 Jeremy Russel Burch
- 👤 David Edward Murray
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 12:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
42 words
A substantially aqueous developer for processing image-wise exposed negative working radiation sensitive plates and comprising an aqueous solution of a non-ionic surfactant characterised in that the solution additionally includes a salt of an aliphatic carboxylic acid containing up to nine carbon atoms.
Claim 2
Dependent Claim
42 words
A substantially aqueous developer for processing image-wise exposed negative working radiation sensitive plates and comprising an aqueous solution of a non-ionic surfactant characterised in that the solution additionally includes a salt of an aliphatic carboxylic acid containing up to nine carbon atoms.
Claim 3
Dependent Claim
20 words
A developer as claimed in Claim 1 characterised in that the aliphatic carboxylic acid contains 7 or 8' carbon atoms.
Claim 4
Dependent Claim
32 words
the A developer as claimed in Claim 1 characterised in that the aliphatic carboxylic acid is heptanoic acid, octanoic acid, 2-ethyl hexanoic acid, propanoic acid, valeric acid, sorbic acid or nonanoic acid.
Claim 5
Dependent Claim
31 words
A developer as claimed in any one of the preceding claims characterised in that it contains from 20 to 300 grams per litre of the salt of the aliphatic carboxylic acid.
Claim 6
Dependent Claim
24 words
A developer as claimed in any one of the preceding claims characterised in that it additionally includes a salt of an aromatic carboxylic acid.
Claim 7
Dependent Claim
26 words
A developer as claimed in Claim 5 characterised in that it includes up to 300 grams per litre of the salt of the aromatic carboxylic acid.
Claim 8
Dependent Claim
28 words
A developer as claimed in any one of the preceding claims characterised in that the surfactant is an alcohol alcoxylate, a modified alcohol alcoxylate or a phenol alcoxylate.
Claim 9
Independent Claim
36 words
A method of processing an image-wise exposed negative working radiation sensitive plate by treating it with a developer characterised in that the developer is a developer as claimed in any one of Claims 1 to 7.
Claim 10
Dependent Claim
37 words
. A method in accordance with Claim 8 characterised in that the radiation sensitive plate has a radiation sensitive coating based on an organic solvent soluble diazo resin, a photocrosslinkable resin, or a photopolymerisable olefinically unsaturated compound.
Claim 11
Dependent Claim
27 words
A method in accordance with Claim 9 characterised in that the organic solvent soluble diazo resin is a modified condensation product of a 4-diazodiphenylamine salt and formaldehyde.
References Cited (Backward Citations)
No citation records indexed.
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