Patent US20010014831A1 successfully refreshed from Google Patents.
EP0029747A1
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EP
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An apparatus for vacuum deposition and a method for forming a thin film by the use thereof
Assignee: Konica Minolta Inc
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Filing: 1980-11-26
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Granted: —
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Expires: 2000-11-26
Abstract
Abstract A method of and apparatus for vacuum deposition of a film on a substrate from a vapour source employing a chamber (1 and an exhaust path (2) by which the chamber can be evacuated, characterised by a discharge tube (4) for activating or ionizing a gas, said discharge tube (4) being connected to said chamber (1) so that an activated or ionized gas may be introduced into said chamber (1).
Inventors
- 👤 Masanari Shindo
- 👤 Isao Myokan
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-23 01:49
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/22; C23C14/24; C23C14/32
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
69 words
An apparatus for vacuum deposition of a film on a substrate from a vapour source, said apparatus comprising a chamber (1), and an exhaust path (2) by which the chamber can be evacuated, characterised by a discharge tube (4) for activating or ionizing a gas, said discharge tube (4) being connected to said chamber (1) so that an activated or ionized gas may be introduced into said chamber (1).
Claim 2
Independent Claim
69 words
An apparatus for vacuum deposition of a film on a substrate from a vapour source, said apparatus comprising a chamber (1), and an exhaust path (2) by which the chamber can be evacuated, characterised by a discharge tube (4) for activating or ionizing a gas, said discharge tube (4) being connected to said chamber (1) so that an activated or ionized gas may be introduced into said chamber (1).
Claim 3
Dependent Claim
39 words
An apparatus according to claim 1, characterised by an electrode (10) for accelerating deposition of ionized particles on a substrate (6) from the vapour source (3) when the vapour source is opposite the electrode (10) in the chamber (1).
Claim 4
Dependent Claim
32 words
An apparatus according to claim 1 or 2 characterised in that there is provided within said chamber'(1) at least one electrode (11) for discharge adjacent the location of a vapour source (13).
Claim 5
Dependent Claim
59 words
An apparatus according to claim 3 characterised by at least one further discharge tube (13) extending into said chamber (1) for introducing an activated or ionized gas, the out-let mouth of said one discharge tube (4) being directed to said at least one electrode (11) and the mouth of said other discharge tube (13) being directed to the substrate.
Claim 6
Dependent Claim
95 words
An apparatus according to claim 2, 3 or 4 characterised in that there is provided within said chamber (1) an electrode (14) for controlling discharge area, said electrode (14) being between a substrate (6) and vapour source (3), and being further from said the substrate and vapour source than, respectively and where provided, said electrode (10) for accelerating deposition and said at least one electrode (11) for discharge, and extending around the area where discharge caused by said electrode (10) for accelerating deposition and/or said at least one electrode (11) for discharge may take place.
Claim 7
Dependent Claim
28 words
An apparatus according to claim 1, 2, 3 or 4 or 5 characterised in that said discharge tube (4) is located outside said chamber (1) and extending thereinto.
Claim 8
Dependent Claim
27 words
An apparatus according to claim 1, 2 or 3 characterised in that the out-let mouth of said discharge tube (4) is directed to towards the substrate (6).
Claim 9
Independent Claim
57 words
A method of vacuum deposition of a film on a substrate from a vapour source in a vacuum chamber, characterised, by the step of supplying ionized gas to the chamber by a discharge tube for activating or ionizing gas, the out-let mouth of said discharge tube being within said vacuum chamber or at the inner surface thereof.
Claim 10
Independent Claim
57 words
A method of vacuum deposition of a film on a substrate from a vapour source in a vacuum chamber, characterised, by the step of supplying ionized gas to the chamber by a discharge tube for activating or ionizing gas, the out-let mouth of said discharge tube being within said vacuum chamber or at the inner surface thereof.
Claim 11
Dependent Claim
30 words
A method according to claim 8, characterised in that an electrode for accelerating deposition of ionized particles on a substrate is provided opposite the vapour source in said vacuum chamber.
Claim 12
Dependent Claim
23 words
A method according to claim 9, wherein said substrate is on said electrode and a negative D.C. voltage is impressed on said electrode.
Claim 13
Dependent Claim
31 words
A method according to claim 8, 9 or 10 characterised in that said vacuum chamber is provided with at least one electrode for discharge adjacent the location of the vapour source.
Claim 14
Dependent Claim
18 words
A method according to claim 11, wherein A.C. voltage is supplied to a pair of electrodes for discharge.
Claim 15
Dependent Claim
62 words
A method according to claim 11 or 12 characterised in that ionized gas is also supplied to the chamber by at least one further discharge tube, the out-let mouth of the first said discharge tube being directed to said at least one electrode for discharge and the out-let mouth of said at least one further discharge tube being directed towards the substrate.
Claim 16
Dependent Claim
72 words
A method according to claim 9, 10, 11, 12 or 13 characterised in that an electrode for controlling discharge area is provided between the substrate and vapour source, and is further from them than, respectively and where provided, the electrode for accelerating deposition and the electrode for discharge and extends around the area where discharge caused by said electrode for accelerating deposition and/or said at least one electrode for discharge take place.
Claim 17
Dependent Claim
24 words
A method"according to claim 8, 9, 10',11 or 12 characterised in that the out-let mouth of said discharge tube is directed towards the substrate.
Claim 18
Independent Claim
27 words
A method according to any one of claims 8 to 15, wherein said vapour source consists of silicon and said activated or ionized gas contains ionized hydrogen.
Claim 19
Independent Claim
25 words
A method according to any one of claims 8 to 16, wherein the inside of said vacuum chamber is maintained at below 10 -2 Torr.
Claim 20
Independent Claim
26 words
A method according to any one of claims 8 to 17, wherein a doping agent is further provided inside said vacuum chamber as a vapour source.
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