DE1292640B
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DE
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Device for depositing high-purity silicon from a high-purity reaction gas containing a silicon compound
Assignee: Siemens Corp
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Filing: 1959-09-23
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Granted: —
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Expires: 1979-09-23
Abstract
No abstract record available.
Inventors
- 👤 Grabmeier
- 👤 Dipl-Phys Dr Josef
Bibliographic Details
Application Number
—
Jurisdiction
DE
Data Source
google_patents
Last Synchronized
2026-11-08 09:11
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/36; H10P14/3602; C; C01; C01B; C01B33/00; C01B33/02; C01B33/021; C01B33/027; C01B33/035; C23; C23C; C23C8/00; C30; C30B; C30B25/00; C30B25/02; C30B25/08; C30B25/14; C30B35/00; C30B9/00; C30B9/14; G; G05; G05D; G05D23/00; G05D23/19; G05D23/1906; G05D23/27; H10P10/00; H10P10/12; H10P14/24; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411
Claims Analysis
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References Cited (Backward Citations)
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